本研究利用Diels-Alder反應將馬來酸酐(MA)與Furan合成具有環狀結構的單體3,6-endoxo-1,2,3,6-tetrahydrophthalic anhydride ( THPA )，並利用(-)-樟腦醇(borneol)和甲基丙烯酸(MAA)以酯化反應合成側鏈含脂肪環之(-)-bornyl methacrylate((-)-BMA)。再將此二單體與馬來酸酐(MA)、二融環[2,2,1]庚烯-[2](NB)和甲基丙烯酸三級丁酯(t-BMA)等單體進行共聚合反應。並藉由FT-IR、1H-NMR、UV、GPC、TGA、DSC和EA進行所合成高分子之定性及定量分析。
由於光阻高分子要求分子量大約在10,000以下，以不同的反應條件可得到各種不同分子量之聚合物，其中以添加正-丁基硫醇(n-Butyl mercaptan)當做鏈轉移劑時可容易得到較低分子量聚合物。本研究所合成之環狀脂肪族共聚物，經由紫外光光譜儀測試得知最大吸收約在220nm左右，故可應用於g-line(436nm)、i-line(365nm)和ArF(193nm)等光蝕刻微影技術。所合成之共聚物與光酸發生劑等配製成化學增幅正型光阻劑，藉由微影製程之測試，探討各光阻之特性曲線，並以含有最佳感度與對比值之PR5光阻劑做顯像，其解像力可達0.5μm。在抗蝕刻之測試上，所合成之高分子之光阻抗蝕刻能力都比PMMA更好。

Alicyclic 3,6-endoxo-1,2,3,6-tetrahydrophthalic anhydride monomer (THPA) was synthesized by Dield-Alder process. Chiral (-)-bornyl methacrylate ((-)-BMA) was prepared from dehydrating esterification of (-)-borneol and methacrylic acid (MAA). Both acrylic monomers were then copolymerized with maleic anhydride (MA), 2-norborene (NB), and tert-butyl methacrylate (t-BMA). The structures and the physical properties of copolymers such synthesized were all confirmed and evaluated by using FTIR, EA, 1H-NMR, UV-Vis, TGA, DSC and GPC.
To obtain copolymers having molecular weight lower than 10000, n-butyl mercaptan was added and low molecular weight copolymers were synthesized successfully. The �max of the alicyclic copolymers is around 220 nm. The copolymers can be applied on the filed of g-line (436 nm), i-line (365 nm), and ArF (193 nm) photoresists. The positive tone lithographic characteristics of the copolymers with photo acid generator (PAG) were estimated. Thermal properties and solubility in various alkaline aqueous solutions of the photoresists were all evaluated. The resolution of 0.5 �m of the positive tone photoresist with PR-5 was achieved. The stability and the reliability of the photoresist with copolymers synthesized in this investigation were all confirmed. It was found that the dry etching resistance of the photoresists is better than that of PMMA.

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