R2R奈米滾印技術是軟性電子產品時代的關鍵製造技術之ㄧ, 其原理是以具微奈米尺度結構之滾筒模仁，在塗佈UV膠的可撓性基材上，以連續性滾壓與UV光固化的方式生產微奈米結構，可提供更快速、低廉的方式製造大面積之奈米產品。 然而，在整個滾印與傳輸的過程中，壓印品質與產率顯然與許多的因素息息相關，如: 軟基材之機械性質、幾何尺寸、傳輸張力、機械組件之公差、運轉速度與振動等。 本文以實驗針對V型溝槽的微奈米結構，針對張力，轉速，與V型溝槽尺寸大小等製程參數，探討其對成型性能之影響，並求取其最佳化之參數。 並以模擬探討UV膠黏滯性與溝槽幾何尺寸對成型性能之影響。 實驗與模擬結果將有利於製程參數最佳化以及提供後續設計之參考依據。

Roll-to-Roll (R2R) nanoimprinting technique has already demonstrated its potential in manufacturing of soft electronics related products. However, the filling and web transportation performances of R2R nanoimprinting depends on many mechanical parameters and their effects must be evaluated for system optimization and device integrity considerations. During a typical web transportation process, a pre-applied tensile stress is required for overcoming possible compressive buckling failure due to geometrical misalignments. As a result, the relationship between the minimum required pre-tensile, geometrical misalignments, and materical properties, must be clarified. In this dissertation, the filling and web transportation performances of R2R nanoimprinting are investigated by both experiment and finite element analysis for the V shape pattern and the preliminary results are demonstrated. In this work the main experiment parameters are web tension, transportation speed, and pattern size. On the other hand, in filling simulation, the studies are focused on viscosity of UV curable resin and pattern size. The results would be important for process optimization and the system re-design for next generation R2R nanoimprinting machines.

[1] H. Ten, A. Gibertson and S. Y. Chou, “Roller nanoimprint lithography,” J. Vac. Sci. Technol, B 16(6), 3926, (1998).
[2] S. Ahn, J. Cha, H. Myung, S. M. Kim and S. Kang, “Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns,” Appl. Phys. Lett. 89, 213101,( 2006).
[3] C. Y. Chang, S. Y. Yang, M. H. Chu, ”Rapid fabrication of ultraviolet cured polymer microlens arrays by soft roller stamping process,” Microelectron Eng 84:pp. 355-361 ,(2006).
[4] S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, “Sub-10
nm imprint lithography and applications,” J. Vac. Sci Technol. B 15(6), pp. 2897-2904,Nov/Dec, (1997).
[5] Nanotechnology and MEMS: Commercializing Ultra-Small Objects Market, Opportunities and Technologies, Published by Takeda Pacific, May ,(2002).
[6] 陳守仁，“奈米轉印技術發展現況 “, 機械工業雜誌, 267 期, pp. 36-46，(2005)。
[7] S. Y. Chou, C. Keimel, J. Gu, “Ultrafast and direct imprint of nanostructures in silicon,” Nature, Vol. 417, pp. 835-837, (2002).
[8] M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake,T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, “Step and flash imprint lithography : a new approach to high-resolution patterning,” Proc. SPIE, 3676(I): 379, (1999).
[9] J. A. Rogers, K. E. Paul and G. M. Whitesides, "Imaging profiles of light intensity in the near field: applications to phase-shift photolithography," Appl. Optics ,37, 2145-2152,(1998).
[10] 蔡宏營 "奈米轉印技術介紹" 工研院機械所 中華民國力學學會會訊，104期，(2003)。
[11] S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and Z. J. Lei . “Roller Nanoimprint Lithpgraphy,” Vac. Sci.Technol.B Vol.15(6),pp.2897-3001, (1997).
[12] Y. Xia, G. M. Whitesides, Angew. Chem.” Replica molding with a polysiloxane mold provides this patterned microstructure,” Int. Ed. 37 pp.550-575,(1998).
[13] R. Maboudian., W. R. Ashurst and C. Carraro, “Self Assembled monolayers as anti-stiction coatings for MEMS: characteristics and recent developments”Sensors and Actuators,Vol.82, pp.219-223
,(2000).
[14] W. R. Ashurst., C. Yau., C. Carraro, C. Lkgf, G. J. Kluth., R T. How and R. Maboudian; “Alkene based monolayersmfilms as anti-stiction coatings for polysilicon MEMS”; Sensors and Actuators Vol. A 91, pp.239-248 ,(2001).
[15] J.N. Ding., P.L. Wong, J.C. Yang; “Friction and fracture properties of polysilicon coated with self-assembled monolayers. ”; Wear, Vol. 206 , pp.209-214 ,(2006).
[16] S. Zankovych, T. Hoffmann, J. Koeth, A. Forchel; “Nanoimprint Lithography: Challenges and Prospects.”; Nanotechnology 12, pp.91-95,(2001).
[17] D.J. Srkgfnivasan, S.V. Willson, C. Grant; ”Step & flash imprint lithography.” Materials Today Vol.8, pp.34-42, (2005).
[18] S. Ahn , J. S. Kim L. J. Guo ,“Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate,” J. Vac. Sci. Technol. B Vol 25, Issue 6, pp.2388-2391 Nov,(2007).
[19] R. Wathen, “Characterizing the Influence of Paper Structure on Web Break,” Licentiate Thesis, Dept. Forest Product Technology, Helsinki University of Technology, (2003).
[20] Y. Lee and J. Wickert,”Stree Field in Finite Width Axisymmetric WoundRolls,”ASME J. Applied Mechanics, Vol.69, pp.130-138,
(2002).
[21] 林宏彝，微奈米滾筒模具製程與成型技術簡介，機械工業雜誌 pp. 53-56，(2006)。
[22] 蘇建彰，轉印模仁之奈米結構製作，機械工業雜誌，269期，pp.44-55，(2005)。
[23] 廖彥鳴，軟材料之機械性質測試與其在半導體製程、真空設備、生醫量測及軟板傳輸之應用，國立成功大學機械工程學系碩士論文，(2007)。
[24] J. Vernon, “Introduction to Engineering Materials (3rd Edition),” MacMillan press, (1993).
[25] J. M. Gere, “Mechanics of Materials (5th Edition),” Brooks/Cole, (2001).
[26] 許瑞峰，微小材料機械特性測試系統之設計製作與其在電子封裝與高分子材料上之應用，國立成功大學機械工程學系碩士論文，(2003)。
[27] G. M. Odegard, T. S. Gates and H. M. Herring, “Characterization of viscoelastic properties of polymeric materials through nanoindentation,” J. Exp. Mech., 45, pp. 130-136, (2005).
[28] G. M. Pharr, W. C. Oliver and F. R. Brotzen, “On the generality of the relationship between contact stiffness, contact area, and elastic modulus during indentation,” J. Mater. Res., 7, pp. 613-617, (1992).
[29] I. N. Sneddon, “The relation between load and penetration in the axisymmetric Boussinesq problem for a punch of arbitrary profile,” Int. J. Engng. Sci., 3, pp. 47-57, (1965).
[30] W. C. Oliver and G. M. Pharr, “Measurement of hardness and elastic modulus by instrumented indentation Advances in understanding and refinements to methodology,” J. Mater. Res., 19,pp. 3-20, (2004).
[31] W. C. Oliver and G. M. Pharr,”An improved technique for determining hardness and elastic-modulus using load and displacement sensing indentation experiments,” J.Mater. Res., 7, pp.1564-83, (1992).
[32] 張瑞慶“奈米壓痕技術與應用”，中華民國力學學會會訊，Vol.114(2006)。
[33] William T. Thmoson and Marie Dillon Dahlen “theory of vibration with applications fifth edition,” pp. 53-55(1993).
[34] A. David Daly “Factors Controlling Traction Between Webs and their Carrying Rolls,” Tappi J., vol 48,pp. 88-90, (1965).
[35] D. Roisum, “The Mechanics of Rollers,” TAPPI, (1996).
[36] Q. X. Pei, C Lu, Z. S. Liu and K. Y. Lam,” Molecular dynamics study on the nanoimprint of copper,” J. Phys. D: Appl. Phys. 40, 4928, (2007).
[37] Q. C. Hsu, C. D. Wu and T. H. Fang, “Deformation Mechanism and Punch Taper Effects on Nanoimprint Process by Molecular Dynamics,” JJAP, 43, 7665, (2004).
[38] Q. C. Hsu, C. D. Wu, and T. H. Fang, Comput. “Studies on nanoimprint process parameters of copper by molecular dynamics analysis,” Mater. Sci., 34 (4), 314, (2005).
[39] R. Wathen,” Characterizing the Influence of Paper Structure on Web Break,” Licentiate Thesis, Dept. Forest Product Technology, Helsinki University of Technology, (2003).
[40] S. Muftu, “Mechanics of Thin, Flexible, Translating Media and Their
Interactions with Surrounding Air,” JSME International Journal, Series C, Vol. 48, pp. 329-336, (2005).
[41] D. Roisum, “The Mechanics of Wrinkling,” TAPPI, (1996).
[42] 吳政達，多重粒子法與分子動力學應用於奈米轉印製程研究,國立成功大學機械工程學系博士論文(2008)。
[43] J. R. Assay and M. Shahipoor,” High-Pressure Shock Compression of Solids”. Springer-Verlag, New York, p. 8., (1992).
[44] ABAQUS, Analysis User’s Manual, Version 6.4 HKS Inc., Providence, Rhode Island., (2005).