在干涉式微影中，為了得到較小週期的干涉條紋，勢必得要使用較小週期的穿透式光柵。一般而言，製作光柵是使用電子束微影的技術，但是使用電子束微影，若要製作小週期又大面積的結構，其價格十分昂貴，而且利用翻印母膜做為奈米壓印的模具的技術也較難製作較小週期的結構。因此，本實驗中希望可以不要額外製作光柵但又可以得到較小週期的光柵，我們使用團鏈共聚物(Block copolymer, BCP)定向自組裝(Directed self-assembly, DSA)的方式來製作較小週期的穿透式光柵。對BCP而言，改變其分子量可以得到不同週期的結構，因此若想得到不同週期的光柵可以簡單的改變其分子量。在團鏈共聚物定向自組裝的時候只需要製作可用來對準控制自組裝方向的結構即可，利用DSA可以輕易地做出週期小於50奈米的結構，且製作所需使用的儀器較為簡單以及花費的金錢也遠低於使用電子束微影製作大面積的光柵。
最後，本研究成功的利用團鏈共聚物定向自組裝的方式，在不同的範圍中製作出週期40奈米的結構，並且成功地將此結構製作成無基材穿透式光柵，本研究將此光柵配合上極紫外光干涉式微影的技術成功得到週期為20奈米的結構。

In general, transmission grating for extreme ultraviolet interference lithography is fabricated by E-beam lithography. However, if we want to fabricate high resolution transmission grating, it will be high cost and it can only fabricate in small range. In this study, we want to fabricate high resolution transmission grating without using high cost process. We choose block copolymer directed self-assembly to achieve our goal.

Block copolymer directed self-assembly can easily fabricate sub-50 nm period nanostructure. In block copolymer lithography, it have to fabricate periodic template to direct block copolymer. We choose the use of nano-imprint and I-line mask exposure aligner to fabricate periodic template. In block copolymer directed self-assembly, we successfully fabricated 40 nm period nanostructure. Then, we use PMGI as sacrificial layer, we successfully fabricated free-standing block copolymer transmission grating. Because transmission grating was fabricated by different materials, we simulated their optical behavior. Optical behavior of transmission grating was analyzed by rigorous coupled-wave analysis. Finally, block copolymer transmission applied in extreme ultraviolet interference lithography.

In conclusion, we applied 40 nm period block copolymer transmission grating in extreme ultraviolet interference lithography, and we successfully achieved half-pitch pattern.

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