在本論文中，主要利用奈米球鏡微影術來製作各種奈米結構，並且運用不同的製程技術，例如傾角旋轉曝光、傾角旋轉蒸鍍等等，配合奈米球微影術來製作金屬圓盤、C環或多層圓環之陣列結構。我們也運用新的技術移除蒸鍍後的金屬膜來回復光阻洞孔徑，使得我們可以製作出多層的圓環結構。此外，我們可以利用Free-Standing技術製作出各種金屬網狀膜運用於其他元件上，我們希望這些純熟的奈米結構製程技術在未來能夠尋找到更多的應用。
　　奈米球鏡微影術是利用奈米球作為奈米級聚焦透鏡聚焦入射之紫外光來對光阻進行曝光，製作出的光阻洞陣列可以作為之後金屬蒸鍍的遮罩使用。[27]我們實驗室也致力於利用奈米球鏡微影術配合線性紫外光源來製作橢圓形及平面之親手性超影材料。[18]在此篇文獻中，我們也加入了各種技術，如傾角旋轉蒸鍍與曝光於製程中來製作不同的奈米結構，此外在文獻中開發了一些重要的製程技術來製作奈米結構。
　首先，奈米球鏡微影術使用對稱光源曝光，藉由旋轉斜向蒸鍍配合Free-Standing技術可以製作金屬網狀陣列結構之蒸鍍遮罩，若將此遮罩覆蓋於其它基板上正向蒸鍍金屬即可製作出奈米金屬圓盤陣列結構。此遮罩具有重複使用性，可省去以往奈米球鏡微影的方式直接利用遮罩蒸鍍，不僅製程簡化，基板的選擇性也更廣。此外Free-Standing技術可讓金屬網狀膜轉移至任何基板上，作為其他元件導電層運用。
　　藉由旋轉斜向蒸鍍可以製作出單層的金屬圓環及C環陣列結構，若是改變蒸鍍方式，運用小角度墊片及多次的旋轉斜向蒸鍍，或是利用傾角曝光微影製程及單次旋轉斜向蒸鍍，可以製作出雙環錯位之金屬陣列結構。另外實驗中還利用多次的旋轉斜向蒸鍍製作MIM(Metal-Insulator- Metal)三層結構之金屬環。
　　在非對稱光源方面，實驗中使用線性光源曝光，因此可以製作出橢圓形光阻洞，我們結合平移與旋轉的方式對單層奈米球做多次曝光，可以製作出長軸約200nm短軸約100nm之L型陣列結構，若是加上傾角曝光還可以製作出兩平行錯位之橢圓金屬陣列。
綜合上述，奈米球鏡微影術配合不同的蒸鍍及曝光方式可以製備各種複雜的金屬奈米結構，不僅尺寸小，其製程所耗費的成本也不高，可以作為未來超穎材料之應用上有效的製程方式。

In this dissertation, fabrications of various nanostructures are demonstrated using the modified Nanospherical-Lens Lithography (NLL). Various techniques, such as angled deposition, angled exposure, are incorporated with NL to fabricate metallic nano-ring, c-ring or multiple ring structures. We also develop technique to remove the deposited material around the nano-apertures so we can fabricate very thick multi-layer ring-patterns. In addition, we can also fabricate metal freestanding membrane that can be used in several other applications. In the future, we hope to find some suitable applications for these developed nanofabricate techniques.

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