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研究生: 簡健峰
Chien, Chien-Feng
論文名稱: 可見光全介電超穎表面中高階多極響應與手性光學之特性研究
Investigation of High-Order Multipolar Responses and Chiral Optical Properties in Visible All-Dielectric Metasurfaces
指導教授: 吳品頡
Wu, Pin-Chieh
學位類別: 博士
Doctor
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 127
中文關鍵詞: 全介電質超穎表面 、米氏共振 、高階多極共振 、雙帶圓二色性 、多重共振 、對稱破壞 、可見光區段 、光學手性
外文關鍵詞: All-dielectric metasurface, Mie resonances, High-order multipolar resonances, Dual-band circular dichroism, Multiple resonance, Symmetry breaking, Visible wavelength regime, Optical chirality
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  • 在可見光波段能同時實現高階多極共振與多重共振的全介電質超穎表面為一項重要的研究課題。本研究將分為兩個部分進行探討。第一部分先建立一套系統化的研究架構,並引入多極展開理論作為分析工具,系統性分析全介電質超穎表面中多極共振與多重共振之形成機制,並著重於高階環形多極矩的物理特性,以實現同時具備寬相位分布與良好光學穩定性。第二部分則以上述研究結果為基礎,進一步探討其應用於全介電質手性結構時所展現的圓二色性光學特性。透過此研究架構,能釐清高階多極與多重共振的激發機制。
    首先,我們提出一種以n型摻雜氮化鎵(GaN)為基礎的全介電質超穎表面,於可見光波段成功激發環形偶極、環形四極、電四極及磁八極等高階多極共振。即使奈米結構存在一些製程偏差,其共振行為仍保持穩定,顯示出良好的光學穩健性。由於奈米結構與基板採用相同材料,降低了介面散射,使環形多極模態得以有效激發。此外,隨著結構尺寸的調變,相位調變範圍可擴展至315°以上。基於上述分析結果,我們進一步探討圓二色性的應用,以實現基於偏振選擇性激發的手性光學功能,而引入了由非晶矽(a-Si)非對稱伽瑪形結構所構成的全介電質超穎表面。藉由破壞面內與旋轉對稱性,該結構展現顯著的雙波段圓二色性響應。多極分析顯示,高CD源自電四極、磁四極與環形偶極的偏振選擇性激發,且在寬入射角範圍內仍維持穩定表現。在這一系列的研究中,我們提出了一套通用的全介電質超穎表面的設計與分析方法,並展現出良好的應用潛力,可應用於可見光波段的光學開關、色彩濾波、光學濾波器以及手性光學等元件開發。

    All-dielectric metasurfaces that simultaneously support higher-order multipolar and multiple resonances in the visible regime represent an important research topic. This study is organized into two parts. The first part establishes a systematic framework based on multipole expansion theory to analyze the formation mechanisms of multipolar and multiple resonances in all-dielectric metasurfaces, with particular emphasis on the physical properties of higher-order toroidal multipole moments and their roles in broadband phase response and optical stability. Based on these results, the second part investigates the circular dichroism characteristics of all-dielectric chiral structures. Overall, this work clarifies the excitation mechanisms of higher-order multipolar and multiple resonances and highlights the potential of such structures for optical applications.
    First, we propose an all-dielectric metasurface based on n-type doped gallium nitride(GaN) that supports higher-order multipolar resonances, such as toroidal dipole, toroidal quadrupole, electric quadrupole, and magnetic octupole modes, in the visible spectrum. These resonances exhibit strong robustness against fabrication imperfections, enabled by reduced interfacial scattering using identical materials for the nanostructures and substrate. Since the nanostructure and the substrate are made of the same material, interfacial scattering is reduced, enabling efficient excitation of the toroidal multipole mode. Furthermore, by varying the structural dimensions, the phase modulation range can be extended to 315°. Based on these results, we further explore circular dichroism applications by demonstrating chiral optical functionalities via polarization-selective excitation using an all-dielectric metasurface consisting of asymmetric amorphous silicon(a-Si) gammadion structures. Owing to broken in-plane and rotational symmetries, pronounced dual-band circular dichroism(CD) responses are achieved. Multipolar analysis reveals that the strong CD arises from selective excitation of electric quadrupole, magnetic quadrupole, and toroidal dipole modes under CPL illumination, which remain stable over a wide range of incident angles. Overall, this work establishes a general design and analysis framework for all-dielectric metasurfaces with potential applications in visible-spectrum optical switches, color filters, optical filters, and chiral optical devices.

    中文摘要 I 英文摘要 II 致謝 XIII 目錄 XIV 表目錄 XVII 圖目錄 XVIII 第一章 緒論 1 1.1 前言 1 1.2 超穎材料和超穎表面簡介 2 1.2.2 發展概述 2 1.2.3 可見光超穎表面的材料應用與設計考量 3 1.2.4 高折射率介電質超穎表面之原理與應用發展 4 1.2.5 超穎表面之環形多極共振模式與高階多極共振簡介 8 1.2.6 電磁多極展開法簡介(electromagnetic multipole expansion) 9 1.3 對掌性超穎表面簡介 13 1.3.2 光學對掌性之特性 13 1.3.3 對掌性超穎表面之設計類型與特性簡介 15 1.3.4 二維與三維對掌性超穎表面之比較 17 1.3.5 光學手性C與光學手性增強CE光學手性簡介 18 1.3.6 超穎表面於光學對掌性之應用 21 第二章 數值模擬與實驗方法 25 2.1 前言 25 2.2 數值模擬方法簡介 25 2.3 儀器介紹與製程方法 27 2.3.2 共濺鍍機(Co-Sputter) 27 2.3.3 旋轉塗佈儀(Spin Coater) 29 2.3.4 電子束微影系統(Electron Beam Lithography) 30 2.3.5 電子束蒸鍍機(Electron Beam Evapoator) 37 2.3.6 感應耦合電漿離子蝕刻機(Inductivity-Coupled Plasma- Reactivelon Etching,ICP-RIE) 38 2.4 樣品製備流程 42 2.4.1 圓錐台形n-GaN超穎表面樣品製備流程 42 2.4.2 非對稱a-Si伽瑪形超穎表面樣品製備流程 47 第三章 光學量測 51 3.1 前言 51 3.2 線偏振態光特性量測元件介紹 51 3.3 圓偏振態光特性量測元件介紹 52 3.4 圓偏振光路量測說明 58 第四章 全介電質n-GaN超穎表面結果分析與討論 59 4.1 研究動機 59 4.2 圓柱形n-GaN超穎表面之多極共振模態與穿透行為 61 4.3 圓錐台形n-GaN超穎表面之平均半徑對穿透率之探討 64 4.4 圓錐台形n-GaN超穎表面之多極共振模態與場分佈分析 66 4.5 半徑調變對多極共振疊合與寬範圍相位調控之探討 68 4.6 結論 69 第五章 非對稱a-Si伽瑪形超穎表面之分析與討論 71 5.1 研究動機 71 5.2 結構設計與手性光學響應 73 5.3 高階多極激發與偏振選擇性對手性共振之調控機制 77 5.4 CD共振波長下的近場電磁響應與光學手性增強 82 5.5 入射角度解析圓二色性與手性光學穩健性 85 5.6 結構週期效應與遠場繞射條件分析 87 5.7 超穎表面於植物光敏素光調控之應用 89 5.8 結論 91 第六章 結論 92 參考文獻 94

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