本論文中，以低成本的電子束微影為基礎的奈米製程方法已被發展出來。這個技術可以相對地低成本製作大規模的奈米結構，在本論文中將此技術分為兩部分做討論，首先我們將介紹E-beam stencil lithography (EBSL)，使用桌上型SEM取代電子槍進行電子束微影，我們預先將圖形定義在利用奈米球鏡微影術所製作的free-standing金屬膜上， 將金屬膜放置在未曝光的電子束光阻上，並將其放入SEM中進行曝光，曝光後得到與預期相同的圖形，我們也可以使用沒有聚焦的電子束來製作以提高其產量。
此外，我們還發現市售的掃描式電子顯微鏡可以不使用任何的模板(stencil)，即可製作出奈米網狀陣列結構，我們將此方法稱為Direct scanning-electron microscope lithography (DSEML)。使用DSEML可以很容易的製作出週期為280nm小的奈米網狀陣列結構。
在論文的最後一部分，我們使用奈米球鏡微影術與二次蝕刻製作InGaN/GaN奈米柱發光二極體陣列，我們可以製作出圓盤直徑約225nm小的奈米柱LED，運用奈米球鏡微影術還可以製作出橢圓狀的奈米柱LED，其長短軸比(aspect ratio)約為2.67。
在電子束微影的研究中，我們已經成功的證實了E-beam stencil lithography(EBSL)與Direct scanning-electron microscope lithography (DSEML)可以被用來製作奈米圖樣於電子阻上；我們還證實了使用奈米球鏡微影術與二次蝕刻製作InGaN/GaN奈米柱LED，未來我們將使用電子束微影為基礎的方法製作奈米結構結合二次蝕刻製作InGaN/GaN奈米柱LED。

In this dissertation, low-cost electron-beam-based nanofabrication methods have been developed. These techniques can be used to fabricate large-scale nanostructures with relative low cost. The first method we developed is referred as Electron-beam stencil lithography (EBSL). The electron beam source is a commercial scanning electron microscope(SEM). The nano-pattern is pre-defined on a free-standing metal membrane fabricated using Nanospherical-lens lithography(NLL) also developed in our research group. The metal membrane is placed on top of the unexposed electron-beam resist thin film inside the SEM and the exposure is achieved after regular image scans. We can also use a unfocused electron beam to improve the fabrication throughput.
In addition, we also discovered that a commercial table-top SEM can also be used to fabricate nano-hole arrays without using any stencil to block the electron beam. We referred this method as “Direct scanning-electron microscope lithography”(DSEML). Using this method, metal nano-hole arrays with periodicity as small as “263 nm” can be easily fabricated.
In the final part of the thesis, we have fabricated InGaN/GaN nanorod LED using NLL and the two-step etching method. We can fabricate nanorod LEDs with diameters as small as “225” nm. The method can be also used to fabricated nano-LEDs with elliptical shape. The aspect ratio is around “2.67”. We will also look to fabricate nano-LED arrays using the proposed electron-beam-based methods.

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