透明導電薄膜 (TCF) 在近年來受到極大的矚目，因為它在消費性電子商品以及能源相關產業上扮演著極其重要的角色。隨著對於攜帶性裝置的改良的要求，以及TCF主原料ITO來源日漸稀少，TCF技術的創新以及尋找ITO的替代品突破變成當務之急。目前，奈米金屬線，奈米碳管以及石墨烯在ITO替代品的競爭上佔據領先的地位。如果我們進一步考慮其他因子，像是機械強度或是對於使用環境容忍度，石墨烯可說是最佳的選擇。
然而石墨烯在電性以及光學性質上，石墨烯仍比其他兩個選項略遜一籌，因此，將石墨烯的性質改善電成為我們的最大目標。首先，我們利用液態沉積噴墨製造TCF試片，這個製程比市面上流行的化學氣相沉積 (CVD) 來得有效率，之後，我們會找出噴墨石墨烯性能極限。為了要突破石墨烯TCF的極限，我們提出一個新的製程，藉由這個製程，我們可以減少石墨的覆蓋，進而提高透光度。我們預期Figure of Merit 會有劇烈的提升，我們希望藉此，石墨烯可以變成最有力的競爭者

Recently, Transparent Conductive Film (TCF) has obtained tremendous attension since it plays an essntial role on both comsumable electronics and energy-related industry. With the request of modification on portable devices and the shortage of main ingredient, ITO, innovation of TCF and replacement for ITO become the first priority in the related research field. Currently, metal nanowire (NW), carbon nano tube (CNT) and graphene stand at the prior position in the campaign. Providing that we take other factors, such as strength and environmental durability into consideration, graphene will be the most appropriate option to fabriacte TCF.
Because the optical and elecronical properties of graphene still fail to compete with the other two candidate, to improve the performance of graphene is going to be the biggest goal for us. We first take adevatage of solution depostion, which is relatively efffcient process comparing to Chemical Vapor Deposition (CVD) to fabricate TCF and find the limitaion of printed graphene TCF. In order to surpass the limit of graphene TCF, we here suggest a new process which can reduece the coverage of graphene in the meanwhile keep low resistance. By this process, we expect the Figure of Merit can be enhanced drastically and we hope it can make graphene the stongest candidate in the fabrication of TCF.

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