本研究建立一套連續式常壓電漿系統來進行光學塑膠基材上之表面處理。在一大氣壓下產生電漿進行表面處理是一種經濟、高效率的低溫表面處理方式。常壓電漿較真空電漿之優點為：可在大氣壓下操作（不需真空腔體）、容易以連續捲對捲製程方式操作、與其他機台整合容易，因此可大幅降低設備、操作及維修費用，並且可省能源、電漿密度高、粒子能量低、處理速度快等。
本實驗以HMDSO做為前驅物，利用PECVD的方式在光學塑膠PC、PMMA上製備氧化矽薄膜。主要研究有兩個方向，其一是研究影響薄膜與基材附著力之條件。其二是探討不同製程對薄膜化學組成之影響。
本實驗藉由改變鍍膜的參數(Carrier gas流量、Scan speed、鍍膜距離、鍍膜時間)及不同的製程方式，來調變氧化矽薄膜之厚度、表面性質與化學元素組成。最後，我們能使表面具有高親水性（水接觸角小於五度）或超高抗沾粘性（水接觸角大於一百度）。本實驗已成功在PC基板上沉積附著力佳的氧化矽薄膜，且經由疏水改質後，其可承受的磨耗次數達3000下。

This study established a set of continuous atmospheric pressure plasma system, treating surface for optical plastic substrate .The atmospheric plasma surface treatment is an economic and efficient method for low temperature surface treatment. Compared with the low-pressure plasma treatment, the atmospheric plasma chemical vapor deposition owns many advantages including atmospheric operation, in-line operation, no vacuum equipment needed, good compatibility with other processes, low equipment ,operation and maintenance cost, and high throughputs.
In this experiment, HMDSO is a SiOx thin-film precursor which is deposed on optical plastic PC, PMMA substrate by PECVD. The study focus on two aspects, one is to study factors which affect the film and substrate adhesion; the second is to explore the impact of operation process on the chemical composition of the film.
In this study, by controlling the coating parameters (Carrier gas flow, Scan speed, distance coated, coating time) and using different fabrication processes which modulating the thickness of SiOx films, various types of film with different surface properties and chemical composition are obtained. The surface can be highly hydrophilic (water contact angle of less than 5 degrees) or ultra-high anti-adhesion properties (water contact angle greater than 100 degrees).
This experiment has been successfully deposited SiOx films of good adhesion on the PC substrate, and after modifying by hydrophobic process, it can withstand abrasion test up to 3000 times.

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