本篇論文主要目的是開發氬氣電漿羽流產生器，用於產生極紫外微影所需要的光源。使用極紫外光源的光刻技術是目前半導體最先進的技術之一，我們想透過角向捏縮電漿羽流的方式產生極紫外光刻光源。我們透過放電產生的電漿來產生極紫外光的方式有三個步驟：（1）為產生氬氣噴流。（2）氬氣噴流通過有高壓之電極後放電，氣體會加溫並游離成電漿羽流，因此溫度會上升至1～10 eV。（3）電漿羽流通過由本實驗室的脈衝功率系統推動的荷姆霍茲線圈（Helmholz coil），透過角向捏縮，以絕熱壓縮的方式將電漿羽流的溫度提升至30 eV，因此產生極紫外光源。在實驗中，我負責的部分為步驟（1）和（2）。透過噴氣系統（Gas-puff system）噴出氬氣噴流，氬氣噴流經由氣管進入在真空腔中跨有高壓的游離收斂-擴張噴嘴(Ionization Convergent-Diveregent Nozzle，ICDN），誘發電弧放電，產生電漿羽流，同時透過噴嘴的結構，將氬氣噴流加速至超音速，使氣體在離開噴嘴時的張角(opening angle)比較小， 能夠準直地進入荷姆霍茲線圈，以利後面透過角向捏縮的絕熱壓縮能夠進行。我們在最後的實驗中也看到了氬氣噴流經離收斂-擴張噴嘴形成電漿。我們透過側視相機捕捉到電漿羽流，也透過干涉儀看到了氣體噴流與電漿羽流所造成探測雷射光相位的變化。 這些資訊有利於我們後續光源的設計。

關鍵字： 極紫外微影光源， 氬氣噴流， 噴氣系統， 離收斂-擴張噴嘴

As the line width of semiconductor manufacturing becomes narrower and narrower, the importance of extreme ultraviolet (EUV) lithography technology with a light source wavelength of 13.5 nm increases significantly in the reproduction of conductor manufacturing processes. The goal of this thesis is to generate an argon plasma plume for the EUV light source using discharged-produced plasma. The EUV light source has three steps. The first step is to generate argon gas puff. In the second step, the argon gas puff passes through an electrode pair with a high voltage across it. An arc discharge is initiated so the gas is ionized and heated. At this time, the temperature rises to 1-10 eV. The third step is to compress the plasma when it passes through the Helmholtz coil driven by the pulsed-power system. The plasma is heated through the adiabatic compression. Finally, the plasma plume radiates EUV light when it is heated to ～30 eV. In this thesis, my goal was to accomplish the first and the second step. An argon gas puff was generated by the gas-puff system. The gas puff was delivered to the ionization convergent-divergent nozzle (ICDN) in the vacuum chamber through the gas tube. A high voltage was provided across the electrode pair in the ICDN. Therefore, an arc discharge was initiated. Therefore, the gas puff was ionized and heated. Meanwhile, the CDN in the ICDN accelerated the plasma plume to supersonic speed. In experiments, the plasma plume was generated and observed from the side-view camera. We also used the interferometer to measure the phase shift of the probe laser beam due to the gas puff/plasma plume. We will use the experimental results to design our EUV light source in the future.

Keywords: Extreme ultraviolet lithography light source, argon gas jet, gas-puff system, convergent-divergent nozzle, opening angle.

[1] https://www.gallagherseals.com/blog/semiconductor-manufacturing-process

[2] https://capst.ncku.edu.tw/PGS/index.php/soft-x-ray-euv-light-source/

[3]Development of the magnetic field in a theta pinch in the EUV light soure, Cheng-Han Du.

[4]https://capst.ncku.edu.tw/PGS/index.php/pulsed-power-generator/

[5]https://capst.ncku.edu.tw/PGS/index.php/pulsed-power-generator/

[6]https://capst.ncku.edu.tw/PGS/index.php/laser-probing/

[7]Paschen_Curve :https://zh.m.wikipedia.org/zh-tw/File:Paschen_Curves.PNG.

[8] M. Hipp, etc., Measurement 3, 55-66 (2004)