本篇論文研究在超高真空系統中，丙醯氯(propanoyl chloride, CH3CH2COCl)在Cu(100)和O/Cu(100)表面的熱化學反應，探討中間態與反應產物。所運用的表面分析技術包括：程序控溫反應/脫附(TPR/D)、反射-吸收紅外光吸收光譜分析(RAIRS) 和X-光光電子能譜(XPS)。
CH3CH2COCl/Cu(100)的熱反應脫附產物主要有hexane-3,4-dione 、 3-hexyne、H2、CO、CO2。由RAIRS及XPS實驗，發現在160 K時C–Cl鍵已完全斷裂，此時表面中間物為CH3CH2CO(ad)、CH3CH2C(O)C(O)CH2CH3(ad)，230 K後hexane-3,4-dione脫附，300 K生成3-hexyne，3-hexyne的生成涉及CH3CH2CO斷裂C–O鍵，病因而產生丙酸根(CH3CH2COO)，在600 K後H2、CO、CO2產物脫附。
CH3CH2COCl在O/Cu(100) 熱反應脫附產物主要有H2、H2O、CO、CO2、CH3CH2COOH 、 H2C=C=O，RAIRS與XPS研究結果發現CH3CH2COCl在150 K斷C–Cl鍵後與表面上預吸附的氧反應形成丙酸根，450 K發生丙酸根脫氫反應，並產生H2、CO、CO2、H2O、丙酸等產物與中間物，550 K時丙酸根分解生成H2C=C=O、H2、CO、CO2。

Thermal chemistry of propanoyl chloride (CH3CH2COCl) on Cu(100) and O/Cu(100) was studied, using temperature-programmed reaction/desorption (TPR/D), reflection-absorption infrared spectroscopy (RAIRS) and X-ray photoelectron spectroscopy. At 160 K, the RAIRS and XPS results show that a large portion of the adsorbed CH3CH2COCl molecules undergo C–Cl bond cleavage, resulting in the formation of CH3CH2CO(ad) on Cu(100). Hexane-3,4-dione and 3-hexyne are found to be desorbed at 230 K and 310 K, respectively. The formation of 3-hexyne is related to C–O cleavage of CH3CH2CO, and the remaining CH3CH2CO(ad) can combine with the oxygen from the C–O cleavage to generate propanoate (CH3CH2COO). The CH3CH2COO decomposes into H2, CO, and CO2 at ~600 K.
On O/Cu(100), CH3CH2COCl reacts with preadsorbed O to form CH3CH2COO(ad) at ~160 K. The CH3CH2COO(ad) further reacts at ~480 K to form H2, H2O, CO, CO2, and CH3CH2COOH. Some surviving CH3CH2COO groups and its dissociation fragments continue to react at ~550 K, producing H2, CO, CO2, and H2C=C=O.

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