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研究生: 謝佩珊
Hsieh, Pei-Shan
論文名稱: 錫銀合金與無電鍍鎳固液界面反應之研究
The Interfacial Reaction between Liquid Sn-Ag Solder and Electroless Nickel-Phosphorous Deposit
指導教授: 林光隆
Lin, Kwang-Lung
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年: 2010
畢業學年度: 98
語文別: 中文
論文頁數: 68
中文關鍵詞: 界面反應無電鍍鎳
外文關鍵詞: Ni-Sn-P
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  •   本研究是探討錫銀無鉛銲錫合金與無電鍍鎳之固液界面反應。利用潤濕天平試驗分析錫銀銲錫合金與無電鍍鎳之潤濕性,並觀察其界面反應,且進一步討論介金屬化合物之成長動力行為。所探討之錫銀合金為Sn-3Ag;使用之無電鍍鎳之含磷量約為7 wt.%。
      由潤濕天平試驗結果可知,錫銀合金與無電鍍鎳在浸鍍溫度為250 oC反應時即有潤濕行為發生,但在浸鍍溫度提高為270 oC反應時,其潤濕時間小於1秒,即具有較佳之潤濕性。
      錫銀合金與無電鍍鎳經過潤濕天平試驗後,在界面上生成Ni3Sn4與Ni3P介金屬化合物。當反應溫度為250 oC時、反應時間從30秒起,試片界面上可發現Ni3Sn4與Ni3P間生成Ni-Sn-P三元素混合層。針對短時間5秒反應的試片界面,利用TEM分析得知,液態銲錫中錫原子擴散進入Ni3Sn4與Ni3P界面而形成Ni-Sn-P三元素混合層,Ni-Sn-P層中於靠近Ni3P處形成Ni3SnP結晶相,而靠近Ni3Sn4處則有顆粒狀Ni3Sn4生成於Sn基地中。當反應溫度為270 oC時,因鎳、錫原子擴散速率加快,P-rich層中除了有Ni3P外,可能另有其他鎳磷化合物於其中。隨著反應時間增長,P-rich層中會逐漸出現擴散孔洞。
      錫銀合金與無電鍍鎳固液反應中,Ni3Sn4在不同反應溫度下的成長動力行為差異不大─Ni3Sn4平均厚度不會因為反應時間有明顯的增加,而P-rich與Ni-Sn-P之成長動力行為,在反應溫度為250 oC時為擴散控制反應,當反應溫度提高為270 oC時其反應轉為混合控制反應。

    This research investigated the interfacial reaction between liquid Sn-3Ag solder and electroless nickel with 7 wt.% phosphorous. The wettability between Sn-Ag solder and electroless nickel was investigated with wetting balance. After the wettability test, the interfacial reaction and the growth kinetics of the IMCs were investigated and discussed.
    The result of wettability test revealed that the wetting behavior occurred between the liquid Sn-Ag solder and electroless nickel deposit at 250 oC. The wetting time at 270 oC was smaller than 1 second and demonstrated a better wettability.
    After the wettability test, the IMCs, Ni3Sn4 and Ni3P formed at the interface between the Sn-Ag solder and electroless nickel. When the test was processed at 250 oC, there were Ni-Sn-P layer formed between Ni3Sn4 and Ni3P after reaction for 30 seconds. The result of TEM analysis on the 5 second reaction specimen indicates that Sn atoms diffused into the interface between Ni3Sn4 and Ni3P to form a Ni-Sn-P ternary layer. It formed Ni3SnP phase in the region near Ni3P layer. When the test was processed at 270 oC, the diffusion rate of Ni, Sn atoms increased so that the P-rich layer might include Ni3P and other Ni-P compounds. Because of the compositions of IMCs were so close that the IMC layers could not be clearly distinguished. With the increasing reaction time, the Kirkendall voids appeared in the P-rich layer gradually.
    In the interfacial reaction between the liquid Sn-Ag solder and electroless nickel, the thickness of Ni3Sn4 did not significantly change with the reaction time. The reaction at 250 oC was diffusion controlled, while it becomes a mixed mode at 270 oC.

    中文摘要 I Abstract II 誌謝 III 總目錄 IV 表目錄 VI 圖目錄 VII 第壹章 簡介 1 1-1 無電鍍鎳 1 1-1-1 無電鍍鎳鍍液組成及特性 1 1-1-2 無電鍍鎳之原理與機制 2 1-1-3 磷含量對無電鍍鎳之影響 4 1-1-4 無電鍍鎳之應用研究 6 1-2 可銲錫性─潤濕現象 8 1-2-1 可銲錫性 8 1-2-2 潤濕現象 9 1-2-3 潤濕天平試驗原理 11 1-2-4 影響潤濕性的因素 14 1-3 無電鍍鎳與銲錫合金之界面反應 16 1-3-1 鎳錫化合物 17 1-3-2 富磷層與鎳-鎳-磷三元素共存 17 1-3-3 研究動機與目的 19 第貳章 實驗方法與步驟 20 2-1 實驗構想 20 2-2 無電鍍鎳 20 2-2-1 底材前處理 20 2-2-2 無電鍍鎳 20 2-3 銲錫合金與無電鍍鎳之潤濕行為 25 2-3-1 基材前處理 25 2-3-2 潤濕天平試驗 25 2-4 銲錫合金與無電鍍鎳之界面反應 25 2-4-1 界面化合物之表面形態分析 26 2-4-2 界面化合物之成份分析 26 2-4-3 穿透式電子顯微鏡分析 26 第參章 結果與討論 28 3-1 錫銀合金與無電鍍鎳之潤濕行為分析 28 3-1-1 溫度對潤濕行為之影響 28 3-2 錫銀合金與無電鍍鎳之界面微組織與分析 31 3-2-1 浸鍍溫度為250 oC之界面微組織 31 3-2-2 Ni-Sn-P三元化合物的生成與探討 36 3-2-3 浸鍍溫度為270 oC之界面現象 44 3-3 介金屬化合物之成長動力行為 47 3-3-1 浸鍍溫度為250 oC之介金屬化合物成長 50 3-3-2 浸鍍溫度為270 oC之介金屬化合物成長 53 3-3-3 溫度對介金屬化合物成長之影響 53 3-4 綜合討論 57 第肆章 結論 61 參考文獻 62

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