本篇論文在研究微波反射計(Microwave reflectometry)系統的研發以及量測磁化電漿(magnetized plasma)參數的應用。量測電漿密度以及電漿密度擾動是很重要的，透過高頻電磁波在電漿中傳遞的理論可以知道，藉由電磁波從截止點(Cutoff point)反射造成的相位變化可以決定這些參數。首先我們對微波反射計系統進行測試以驗證其功能，然後進行電漿實驗以量測電漿密度擾動。最後我們討論此反射計系統需要改進的地方。

This thesis develops a reflectometry system for diagnostics of plasma density profile and fluctuations in magnetized plasmas. Measuring the plasma density profile and fluctuations are important for studying magnetized plasmas. By using the theory of high frequency wave propagation in magnetized plasmas, the phase shift caused by EM wave reflection from the plasma cutoff layer can be measured to determine the plasma density profile and fluctuations. We first describe the results of the system test. Then, we apply the system to measure plasma density in the magnetic mirror device at the Plasma and Space Science Center (PSSC) of the National Cheng Kung University (NCKU). Presently, the system can measure only density fluctuations because the probe wave has a fixed frequency. Finally, we describe the necessary improvements of the reflectometry system in the future.

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