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研究生: 韓努志
Hasan, Md. Nazmul
論文名稱: 準分子雷射製作之非球面透鏡應用於雷射二極體直束微影製程
Beam pen lithography based on focused laser diode beam with single microlens fabricated by excimer laser
指導教授: 李永春
Lee, Yung-Chun
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2014
畢業學年度: 103
語文別: 英文
論文頁數: 67
外文關鍵詞: Laser Diode, Excimer Laser Micromachining, Beam focusing, Aspheric microlens, Diffraction limited spot.
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  • This thesis propose a method for minimizing the focused spot size of an elliptically-diverging laser diode beam by means of a circular aperture and single plano-convex aspherical microlens. The proposed microlens is fabricated using an excimer laser dragging method and has two different profiles in the x- and y-axis directions. The focused spot size of the beam is examined both numerically and experimentally. The results suggest that with an appropriate experimental setup, the focused spot size approaches the optical diffraction limit. The feasibility of proposed approach for beam pen lithography application is demonstrated by dotted, straight lines and spiral patterns.
    In this thesis, the focused spot size of laser diode beam with a single aspheric microlens fabricated by excimer laser is examined by both simulation and experiment. Firstly, a model has been demonstrated for laser diode characteristics and beam propagation and then optimized a lens profile to achieve diffraction limited spot size with raytracing software Zemax. A polynomial surface function is used for lens profiles which have three main advantages, (1) it enables the design of different lens profiles in the x- and y-axis directions; (2) it makes possible the realization of complex surface patterns and (3) it is compatible with the excimer laser dragging method. Based on simulated result, the coefficients of polynomial profile function for plano-convex microlens are found. The excimer laser dragging method is then used to fabricate the aspheric microlens. By this method desired surface profile of the microlens is achieved with better surface roughness. The microlens is then easily assembled with laser diode and circular aperture by simple adhesive without any holder or collimating tube which will reduce assembly cost. Finally using this assembly laser diode beam is focused near optical diffraction limit.
    The proposed method of beam focusing is used in beam pen lithography to write high resolution patterns on the substrate. To investigate the patterning sizes, the substrate is first coated with PR, then deposit a thin gold layer on it and finally PR is removed by lift-off process. The three types of patterns including dotted, straight lines and spiral are demonstrated. The smallest metal-dot dimension is 2.57 μm and 2.16 μm in the x- and y-axis directions, whereas the smallest line-width for straight line and spiral are 3.05 μm and 2.16 μm, respectively. Thus the method can be used for write any kind of patterns like dotted, line, spiral, characters and so on. Further reduction in spot size can be done by precise stage movement and minimizing fabrication error.

    Table of Contents Abstract I Acknowledgement III Table of Contents IV List of Figures VI List of Tables X Chapter 1 Introduction 1 1-1 Background 1 1-2 Problem statement 2 1-3 Literature review of beam manipulation 4 1-3-1 Beam Collimating and Focusing with Lenses 5 1-3-2 Beam Collimation and Truncation with a Single Lens 6 1-3-3 Beam Circularization with an Aperture 7 1-3-4 Beam Circularization with two cylindrical Lenses 8 1-3-5 Beam Circularization with Anamorphic Prism pair 9 1-3-6 Beam Circularization with a Single Mode Fiber 10 1-3-7 Beam Circularization with micro-cylindrical lens 11 1-3-8 Beam Circularization, collimation, deastigmatism by a aspheric lens 13 1-3-9 Comparison 14 1-4 Research motivation and objectives 14 Chapter 2 Simulation with Zemax and Matlab 16 2-1 Beam propagation simulation 16 2-1-1 Beam size calculation 16 2-1-2 Modeling of beam propagation in Zemax 17 2-2 Lens simulation 19 2-3 Lens profile in Matlab 22 Chapter 3 Excimer Laser fabrication of microlens 24 3-1 Characteristic of excimer laser 24 3-2 Excimer laser micromachining system 26 3-3 Excimer laser bi-axis dragging method 30 3-3-1 Contour mask design 31 3-3-2 Fabricating aspheric microlens for beam focusing 35 Chapter 4 Experimental setup and Results 39 4-1 LD module assembly 39 4-1-1 Aperture alignment 39 4-1-2 Lens alignment 40 4-2 Focused spot measurement 42 4-3 Application of LD module in beam pen lithography 43 4-3-1 Dotted patterns 45 4-3-2 Continuous patterns 47 Chapter 5 Conclusion 50 5-1 Summary 50 5-2 Future work 51 References 53

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