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研究生: 陳俊方
Chen, Chun-Fang
論文名稱: 適用於量產應用之基於AVM的智慧型取樣決策機制
Intelligent Sampling Decision Scheme Based on the AVM System for Mass Production Applications
指導教授: 鄭芳田
Cheng, Fan-Tien
共同指導教授: 洪敏雄
Hung, Min-Hsiung
學位類別: 博士
Doctor
系所名稱: 電機資訊學院 - 製造資訊與系統研究所
Institute of Manufacturing Information and Systems
論文出版年: 2014
畢業學年度: 103
語文別: 英文
論文頁數: 60
中文關鍵詞: 虚擬量測全自動虛擬量測系統智慧型取樣決策機制固定智慧型取樣決策機制動態智慧型取樣決策機制
外文關鍵詞: Virtual metrology (VM), Automatic Virtual Metrology (AVM) System, Intelligent Sampling Decision (ISD) Scheme, Static Intelligent Sampling Decision (Static ISD) Scheme, Dynamic Intelligent Sampling Decision (Dynamic ISD) Scheme
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  • 晶圓檢測在監控晶圓產品品質中扮演重要的角色。然而,為獲取實際量測值則需要購置大量量測機台與耗費因執行實際量測所須之生產週期時間來達成。因此,在不犧牲產品品質的原則下,能盡可能地降低抽樣頻率以減少生產成本,為高度優先之目標。文獻顯示已有數種抽樣方法被提出,以便能達到此目的。這些方法乃是於生產製程中利用檢視實際抽樣樣本之方式,來監測產品品質。然而,在製程穩定的條件下,即使實際資料並未獲得,我們亦可採用虛擬量測(VM)來監視產品品質。因此,運用可靠的虛擬量測系統來設計取樣決策機制,將可能更進一步地降低抽測頻率。
    作者過去已發展完成全自動虛擬量測(AVM)系統於多種虛擬量測應用。因此,本論文將採兩階段的方式,以研發並實現建置一個通用型抽樣決策機制。其中,第一階段將應用AVM系統內之各式指標,來發展抽測頻率固定之智慧型取樣決策機制,以便在維持虛擬量測精度的條件下,能更進一步地降低量測抽樣頻率。而第二階段則更進一步地研發具自動調配抽測頻率之動態智慧型取樣決策(Dynamic ISD)機制,使本智慧型取樣決策機制能更具彈性,且更有效率。

    Wafer inspection plays a significant role in monitoring the quality of wafers production for continuous improvement. However, it requires measuring tools and additional cycle time to do real metrology, which is costly and time-consuming. Therefore, reducing sampling rate to as low as possible is a high priority to reduce production cost. Several sampling methods in the literature were proposed to achieve this goal. They utilized real sampling inspections as the representatives for the other related wafers to monitor the whole production process. Under the condition of stable manufacturing process, virtual metrology (VM) may be applied to monitor the quality of wafers, while real metrology is unavailable. Therefore, the sampling rate may further be reduced with a sampling decision scheme being designed according to reliable VM.
    Two stages of tasks are designed and implemented to construct a generic intelligent sampling decision scheme. The first stage is to develop the Static Intelligent Sampling Decision (Static ISD) scheme with static sampling rate and the advanced second stage is to build the Dynamic Intelligent Sampling Decision (Dynamic ISD) scheme with dynamic/automated sampling rate. The authors have developed the automatic virtual metrology (AVM) system for various VM applications. Therefore, this paper focuses on applying various indices of the AVM system to develop both the Static and Dynamic ISD schemes for reducing sampling rate, while VM accuracy is still sustained.

    摘 要 I ABSTRACT II 致 謝 III ACKNOWLEDGEMENTS IV CONTENTS V FIGURE CONTENTS VII TABLE CONTENTS VIII CHAPTER 1 INTRODUCTION 1 1.1 Background and Motivation 1 1.2 Organization 3 CHAPTER 2 STATIC INTELLIGENT SAMPLING DECISION SCHEME BASED ON THE AVM SYSTEM 4 2.1 Introduction 4 2.2 Literature Review 5 2.3 Key Features of the AVM System 7 2.4 Static Intelligent Sampling Decision (Static ISD) Scheme 12 2.4.1 Operational Flowchart of the Static ISD Scheme 18 2.4.2 Advanced Dual-Phase Algorithm with Static ISD Scheme 20 2.5 Illustrative Examples 22 2.5.1 Example of Etching Process 22 2.5.2 Example of PECVD Process 26 CHAPTER 3 DYNAMIC INTELLIGENT SAMPLING DECISION SCHEME BASED ON THE AVM SYSTEM 30 3.1 Introduction 30 3.2 Dynamic Intelligent Sampling Decision Scheme 33 3.2.1 Operational Flowchart of the Modifying N 40 3.2.2 Operational Flowchart of the Dynamic ISD Scheme 44 3.2.3 Advanced Dual-Phase Algorithm with Dynamic ISD Scheme 46 3.3 Illustrative Example of PECVD Process 48 CHAPTER 4 CONCLUSION 52 4.1 Conclusion 52 4.2 Future Work 53 ACKNOWLEDGMENT 53 ABBREVIATION LIST 54 REFERENCES 55 BIOGRAPHY 58 PUBLICATION LISTS 59

    [1]J. Moyne, “International Technology Roadmap for Semiconductors (ITRS) Perspective on AEC/APC,” ISMI AEC/APC Symposium XXI - North America, 2009, Ann Arbor, Michigan USA, Sep. 2009.
    [2]M.-H Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, “A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing,” IEEE/ASME Transactions on Mechatronics, vol. 12, no. 3, pp. 308-316, June 2007.
    [3]F.-T. Cheng, Y.-C. Chang, H.-C. Huang, C.-A. Kao, Y.-L. Chen, and J.-L. Peng, “Benefit Model of Virtual Metrology and Integrating AVM into MES,” IEEE Transactions on Semiconductor Manufacturing, vol. 24, no. 2, pp. 261-272, 2011.
    [4]F.-T. Cheng, H.-C. Huang, and C.-A. Kao, “Developing an Automatic Virtual Metrology System,” IEEE Transactions on Automation Science and Engineering, vol. 9, no. 1, pp. 181-188, 2012.
    [5]Y.-T. Huang and F.-T. Cheng, “Automatic Data Quality Evaluation for the AVM System,” IEEE Transactions on Semiconductor Manufacturing, vol. 24, no. 3, pp. 445-454, Aug. 2011.
    [6]F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, “Evaluating Reliance Level of a Virtual Metrology System,” IEEE Transactions on Semiconductor Manufacturing, vol. 21, no. 1, pp. 92–103, Feb. 2008.
    [7]F.-T. Cheng, H.-C. Huang, and C.-A. Kao, “Dual-Phase Virtual Metrology Scheme,” IEEE Transactions on Semiconductor Manufacturing, vol. 20, no. 4, pp. 566-571, Nov. 2007.
    [8]T.-H. Lin, M.-H. Hung, R.-C. Lin, and F.-T. Cheng, “A Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing,” in Proc. 2006 IEEE International Conference on Robotics and Automation, Orlando, Florida, U.S.A., pp.1054-1059, May 2006.
    [9] Weber, “Virtual Metrology and Your Technology Watch List: Ten Things You Should Know about This Emerging Technology,” Future Fab International, issue 22, section 4, pp. 52-54, January 2007.
    [10]Chien, C-F., K-H. Chang, and C-P. Chen, “Design of a sampling strategy for measuring and compensating for overlay errors in semiconductor manufacturing,” International Journal of Production Research, vol. 41, issue 11, pp. 2547-2561, Nov. 2003.
    [11]A. Holfeld, R. Barlović, and R. P. Good, “A Fab-Wide APC Sampling Application,” IEEE Trans. on Semicond. Manuf., vol. 20, no. 4, pp. 393–399, Nov. 2007.
    [12] J. H. Lee, “Artificial Intelligence-Based Sampling Planning System for Dynamic Manufacturing Process,” Expert System with Apps., vol. 22, pp. 117-133, Feb. 2002.
    [13]J. Nduhura-Munga, S. Dauzère-Pérès, P. Vialletelle, and C. Yugma, “Dynamic Management of Controls in Semiconductor Manufacturing,” in Proc. IEEE/SEMI Advanced Semicond. Manuf. Conf., Saratoga Springs, NY, USA, pp. 1-6, May 2011.
    [14]J. Nduhura-Munga, G. Rodriguez-Verjan, S. Dauzère-Pérès, C. Yugma, P. Vialletelle, and J. Pinaton, “A Literature Review on Sampling Techniques in Semiconductor Manufacturing,” IEEE Trans. on Semicond. Manuf., vol. 26, no. 2, May 2013.
    [15]A. Bousetta and A. J. Cross, “Adaptive Sampling Methodology for Inline Defect Inspection,” in Proc. IEEE/SEMI Advanced Semicond. Manuf. Conf., 2005, pp. 25–31.
    [16]D. Kurz, C. De Luca, and J. Pilz, “Sampling Decision System in Semiconductor Manufacturing Using Virtual Metrology,” in Proc. 2012 IEEE International Conference on Automation Science and Engineering (CASE 2012), Seoul, Korea, pp. 74-79, August 2012.
    [17]D. Kurz, C. De Luca , and J. Pilz, “Monitoring Virtual Metrology Reliability in a Sampling Decision System,” in Proc. 2013 IEEE International Conference on Automation Science and Engineering (CASE 2013), Madison Wisconsin, USA, pp. 20-25, August 2013.
    [18]C.-F. Chen, F.-T. Cheng, C.-C. Wu, and H.-H. Huang, “Preliminary Study of an Intelligent Sampling Decision Scheme for the AVM System,” in Proc. of The 2014 IEEE International Conference on Robotics and Automation (ICRA 2014), pp. 3496-3501, Hong Kong, China, May 31-June 7, 2014.
    [19]C.-A. Kao, F.-T. Cheng, W.-M. Wu, F.-W. Kong, and H.-H. Huang, "Run-to-Run Control Utilizing Virtual Metrology with Reliance Index," IEEE Transactions on Semiconductor Manufacturing, vol. 26, no. 1, pp. 69-81, February 2013.
    [20]F.-T. Cheng and Y.-C. Chiu, "Applying the Automatic Virtual Metrology System to Obtain Tube-to-Tube Control in a PECVD Tool," IIE Transactions, vol. 45, issue 5, pp. 670-681, March 2013.
    [21] G. A. Carpenter & S. Grossberg, “ART 2: Self-organization of Stable Category Recognition Codes for Analog Input Patterns,” Applied Optics, vol. 23, no.12, pp.4919-4930, Dec 1987.
    [22]F.-T. Cheng, C.-A. Kao, C.-F. Chen, and W.-H. Tsai, “Tutorial on Applying the VM Technology for TFT-LCD Manufacturing,” submitted to IEEE Transactions on Semiconductor Manufacturing.
    [23]F.-T. Cheng, C.-F. Chen, Y.-S. Hsieh, H.-H. Huang, and C.-C. Wu “Intelligent Sampling Decision Scheme Based on the AVM System,” International Journal of Production Research, published online: September 2014, DOI: 10.1080/00207543.2014.955924.
    http://dx.doi.org/10.1080/00207543.2014.955924

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