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研究生: 游恩承
You, En-Cheng
論文名稱: 以銦為支撐材料之氧化鋅表面電漿極化子雷射共振腔結構設計與光學性質分析
Structural Design and Optical Property Analysis of ZnO Surface Plasmon Polariton Laser Microcavities Supported by Indium
指導教授: 周昱薰
Chou, Yu-Hsun
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 59
中文關鍵詞: 氧化鋅混合表面電漿微共振腔銦支撐層室溫低壓接合
外文關鍵詞: zinc oxide, hybrid plasmonics, microcavity, indium supporting layer, room-temperature low-pressure assembly
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  • 本研究以微共振腔增強 SPP 耦合為設計目標,進行結合 DBR、ZnO/Al₂O₃/Al 與金屬支撐層之元件設計、製作及光學量測。以具備優異室溫發光特性的寬能隙氧化鋅(ZnO)奈米粉末作為增益介質,底端結合熱蒸鍍鋁與自然生成的氧化鋁作為阻隔層,頂端則搭配高反射率之二氧化矽與二氧化鉿分散式布拉格反射鏡(DBR),以期在室溫條件下製作出突破繞射極限的雷射共振腔元件。為降低高溫製程對多層膜與增益材料的影響,本研究採用上、下基板分離製作後再組裝的流程,比較金(Au)與銦(In)支撐層在室溫低壓組裝下的腔體厚度與均勻性,評估其作為微共振腔支撐材料的適用性。結果顯示,以金為支撐材料所製成的樣品由多點反射光譜反推之平均等效腔體厚度為 1.84 μm,約為 160 nm 設計總支撐厚度的 11.5 倍,並伴隨局部剝離與厚度不均。此現象顯示,在手動低壓組裝條件下,介面微粒、基板表面粗糙度與施力分佈皆可能顯著影響實驗結果,難以僅由材料本身性質進行解釋。
    改用銦作為支撐材料後,第一版七件樣品之中心等效腔體厚度介於 622–1570 nm;其中厚度較低的三件樣品經九點取樣量測後,平均值分別為 779、721 與 694 nm。第二版以四種支撐層幾何分布作為操縱變因進行實驗,並導入氮氣槍吹拭清潔步驟,經由量測穿透光譜推得 390–394 nm 的等效腔體厚度。此結果顯示,第二版流程所製樣品具有較小的等效腔體厚度。
    在光學設計方面,二維有限元素模型於 380 nm 附近得到反射率局部最小值(R = 0.9815,即 98.15%),並顯示 ZnO/Al₂O₃/Al 介面附近可能形成局部電場侷限。光致發光量測中,一個代表性測點在 378 nm 出現窄峰;當泵浦功率密度接近 0.8 kW/cm² 時, L-L 曲線斜率增加,半高全寬(FWHM)由約 5–6 nm 縮小至約 0.2 nm。上述結果支持此結構具有受激發光或類雷射行為,並展現以銦支撐混合微共振腔作為近紫外微型光源平台的潛力。

    This study designs, fabricates, and optically characterizes a microcavity device integrating a distributed Bragg reflector (DBR), a ZnO/Al₂O₃/Al surface-plasmon structure, and metallic supports. The original design goal is to enhance surface plasmon polariton (SPP) coupling through microcavity integration. ZnO nanopowder was used as the near-ultraviolet gain medium, while a SiO₂/HfO₂ DBR and an Al/Al₂O₃ interface were incorporated to provide optical feedback and plasmonic field confinement. Because the multilayer films and ZnO gain material are stress-sensitive, the device was assembled at room temperature under low pressure. Au and In were compared as supporting materials to evaluate cavity spacing and assembly uniformity. The Au-supported samples showed an average effective cavity thickness of 1.84 μm, much larger than the designed supporting thickness. In-supported samples reduced the effective cavity thickness, and the second-generation process yielded values of approximately 390–394 nm. Power-dependent photoluminescence measurements showed a narrow emission peak near 378 nm, an increased light-in-light-out slope, and linewidth narrowing near 0.8 kW/cm². These results indicate stimulated-emission-like or lasing-like behavior. The enhancement of SPP coupling by the microcavity remains to be further verified.

    第一章 序論 1 1.1 前言 1 1.2 研究動機與目的 2 1.3 論文大綱 3 第二章 實驗原理 4 2.1 馬克士威方程組與表面電漿極化子基礎理論 4 2.2 混合表面電漿波導與能量極限限域機制 5 2.3 氧化鋅激子與極化子雷射之理論背景 6 2.4 光學共振腔理論、雷射速率方程式與模態競爭理論 7 2.4.1 雷射技術之發展沿革與光電應用概述 7 2.4.2 光與物質之基本躍遷機制 8 2.4.3 光學共振腔邊界條件與模態體積侷限 11 2.4.4 雷射動態速率方程式與受激輻射非線性判定準則 12 2.4.5 多模態增益競爭與單/多模態選擇物理機制 12 第三章 模擬步驟與實驗方法 13 3.1 有限元素分析與共振腔模型最佳化 13 3.1.1 頻域波動方程式與邊界條件設定 13 3.1.2 材料參數與幾何網格切分 14 3.2 支撐層材料之比較(Au 與 In) 15 3.3 微共振腔製程 17 3.3.1 下層試片製程 17 3.3.2 上層試片製程 19 3.3.3 氧化鋅滴塗與室溫低壓組裝 19 第四章 實驗結果討論 22 4.1 有限元素分析模擬 22 4.1.1 腔體幾何與波長之反射譜二維掃描 22 4.1.2 電場分佈模擬 24 4.2 模擬與實際製作的 DBR 特性比較 25 4.2.1 以 COMSOL 模擬 DBR 結構特性 25 4.2.2 實際製作的 DBR 特性 26 4.3 熱蒸鍍薄膜厚度驗證 27 4.4 以金為支撐材料的實驗結果與分析 29 4.5 以銦作為支撐材料的實驗結果與分析 31 4.5.1 第一版樣品支撐結構設計(以銦作為支撐材料) 31 4.5.2 第二版樣品支撐結構設計(以銦作為支撐材料) 35 4.6 光致發光光譜特徵 37 4.7 受激發光行為與臨界泵浦功率密度分析 39 第五章 結論與未來展望 41 5.1 結論 41 5.2 未來展望 42 參考文獻 43

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