| 研究生: |
呂國豪 Lu, Kuo-Hao |
|---|---|
| 論文名稱: |
雷射輔助奈米機械拋光之研究 Study of the laser assisted mechanical nano-polishing |
| 指導教授: |
林震銘
Lin, Jehnming |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2006 |
| 畢業學年度: | 94 |
| 語文別: | 中文 |
| 論文頁數: | 111 |
| 中文關鍵詞: | 勢能 、分子 、拋光 |
| 外文關鍵詞: | molecular, polishing, potentail |
| 相關次數: | 點閱:45 下載:4 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
摘要
本文的目的是以分子動力學理論,研究在雷射輔助下對於奈米鋁基材的拋光行為,並進行實驗與之比較。以fcc結構的鋁基材作為分子動力學模擬的拋光工件。本文數值方法使用Gear五階預測修正法來計算微系統原子的位置、速度與加速度,並配合Verlet鄰近表列法和Morse勢能函數來處理分子間的相互作用力。
數值模擬的內容主要分成三部份:第一部分將討論以鎳金屬為磨粒、鋁金屬為平板的奈米拋光過程中,整個系統的受力以及溫度變化情形。第二部份則探討雷射能量的高低對拋光過程中,工件的溫度分布以及受力之影響。第三部份則是針對奈米拋光的加工機制來做區分以及探討。
由數值模擬可以發現:(1)磨粒在經過工件之後會將工件原子移除,這可以視為在拋光時的真實行為。(2)雷射的能量會讓工件表面溫度瞬間上升,而減少熱影響區的範圍。(3)雷射造成的溫升可以減少拋光時磨粒對工件的施力。(4)加入雷射可以改善拋光過程中工件變形。
Abstract
The objective of this thesis is to study the laser-assisted nanopolishing phenomena of aluminum substrate with nickel particle by molecular dynamics theory, and the results are compared with experiments. The Gear’s fifth order predictor-corrector algorithms is adapted to calculate the positions, velocities, and accelerations of atoms under various displacement condition while the interactions of atoms are dealt with Verlet’s neighbor lists and Morse’s potential.
The numerical simulation is to study the force of nanopolishing and temperature distribution of substrate with various laser energy densities, and investigate the mechanism of nanopolishing.
In the numerical simulations, it can be found:(1) The nickel particle will remove aluminum atoms of substrate during the polishing processes. (2) The laser energy will increase the temperature of workpiece surface. The heating effect can reduce the local heat affected zone. (3) The force between particle and workpiece is decreased with increasing temperature by laser irradiation. (4) The laser can improve the surface quality of workpiece.
[1]Malshe A. P., Park B. S., Brown W. D., Naseem H. A., “A review of techniques for polishing and planarizing chemically vapor-deposited(CVD)diamond films and substrates”, Diamond and Related Materials, vol. 8, pp. 1198-1213, 1999.
[2]Bruton E., “Diamonds”, NAG, London, 1970.
[3]Yoshikawa, “Diamond Optics III”, SPIE, vol. 1325, n210, 1990.
[4]Raju G. S., “Chemical assisted mechanical polishing and planarization of CVD diamond substrates for MCM application”, M. S. E. E Thesis University of Arkansas Library, Fayetteville, 1994.
[5]Ozkan A. M., Malshe A. P., Brown W. D., “Sequential multiple-laser-assisted polishing of free-standing CVD diamond substrates” , Diamond and Related Materials, vol. 6, pp. 1789, 1997.
[6]Hirata A., Tokura H., Yoshigawa M., “Smoothing of chemically vapour deposited diamond films by ion beam irradiation”, Thin Soild Films, vol. 212, n43, 1992.
[7]曾偉志,VLSI-先進模組技術課程 ,pp. 48-51,1998.
[8]李臻誠,晶圓化學機械研磨之研磨液流場及磨潤性能理論分析與實驗,國立成功大學機械工程學系,碩士論文,民國87年.
[9]Preston F. W., “The theory and design of plate glass polishing machines”, J. Soc. Glass technol., vol. 11 , pp. 214-247, 1927.
[10]Cook L. M., “Chemical process in glass polishing”, J. Noncrystalline Solid, vol. 120, pp. 152-171, 1990.
[11]Runnels S. R., Renteln P., “Modeling the effect of polish pad deformation on wafer surface stress distribution during chemical mechanical polishing”, Dielectric Sci. Technol., pp. 100-121, 1993.
[12]Runnels S. R., “Feature-Scale Fluid-Based Erosion Modeling for chemical mechanical polishing”, Electrochemical Socity Active Member, vol. 141, n7, pp. 1900-1904, July 1994.
[13]Runnels S. R., Eyman L. M., “Tribology analysis of chemical mecanical polishing”, Electrochemical Socity Active Member, vol. 141, n6, pp. 1698-1701, June 1994.
[14]Yu T. K., Chris C., Lee M. O., “A statistical polishing Pad-Model for chemical mechanical polishing”, IEEE, pp. 35, 1993.
[15]Tseng W. T., Liu C. W., Yeh C. f., “Effect of mechanical characteristics on the chemical mechanical polishing of dielectric thin films”, Thinsolid Films, vol. 290-291, pp. 458-463, 1996.
[16]Tezuka S., Yoshikawa M., “Study of the marking processing of IC packages by YAG laser” ,International Journal of the Japan Society for Precision Engineering, vol. 25, n4, pp. 297-290, Dec. 1991.
[17]Rothschild M., Arnone C., Ehrlich D. J., “Excimer-Laser Etching of Diamond and hard carbon films by direct writing and optical projection”, Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, vol. 4, n1, pp. 310-314 , Jan. 1986.
[18]Ageev V. P., Armeyev V. Y., Chapliev N. I., Kuzmichov A. V., Pimenov S. M., Ralchenko V. G., “Laser processing of diamond and diamond-like films”, Materials and Manufacturing Processes, vol. 8, n1, p 1-8, 1993.
[19]Ravi K. V., Zarifis V. G., “Laser polishing of diamond,Proceedings 3rd International Symposium on Diamond Materials”, The Electrochemical Society, Pennington, 1993.
[20]Shao T. M., Hua M., Tam H. Y., Cheung H. M., “An approach to modeling of laser polishing of metals”, Surface & Coatings technology, vol. 197, pp. 77-84, 2005.
[21]鄭茂川,使用準分子雷射於鑽石磨的平坦化研究,國立成功大學機械工程學系,碩士論文,民國92年.
[22]Pierson H. O., “Handbook of Carbon”, Graphite,Diamond amd Fullerenes:properties、processing and application, Noyes Publications, 1993.
[23]Windholz R., Molian P. A., “Nanosecond pulsed excimer laser machining of chemical vapour deposited diamond and highly oriented pyrolytic graphite: Part I An experimental investigation”, Journal of Materials Science, vol. 32, pp. 4295, 1997.
[24]Windholz R., Molian P. A., “Nanosecond pulsed excimer laser machining of chemically vapour-deposited diamond and graphite: Part II Analysis and modeling” , Journal of Materials Science, vol. 33, pp.523, 1998.
[25]Laguarta F., Lupon N., Armengol J., “Optical glass polishing by controlled laser surface-heat treatment”, Applied Optics vol. 33, n27, 20, September 1994.
[26]Sysoev V. K., “Laser etching and polishing of quartz tubes”, Glass and Ceramics vol. 60, pp. 3-4, 2003.
[27]Tokarev V. N., Wilson J. I. B., Jubber M. G., John P., Milne D. K., “Modelling of self-limiting laser ablation of sufaces:application to the polishing of diamond films”, Diamond and Related Material, vol. 4, pp.169-176 , 1995.
[28]Pimenov S. M., Kononenko V. V., Ralchenko V. G., Konov V. I., Gloor S., Luthy W., Weber H. P., Khomich A. V., “Laser polishing of diamond plates”, Appl. Phys. vol. 69, pp.81-88, 1999.
[29]Maekawa K., Itoh A., “Friction and tool wear in nano-scale maching-a molecular dynamics approach”, Wear, vol. 188, pp. 115-122, 1995.
[30]Fang T. H., Weng C. L., “Three-dimensional molecular dynamics analysis of processing using a pin tool on the atomic scale”, Nanotechnology, vol. 11, pp. 148-153, 2000.
[31]Fang T. H., Weng C. L., Chang J. G., “Molecular dynamics simulation of nano-lithography process using atomic force microscopy”, Surface Science, vol. 501, pp. 138-147, 2002.
[32]Ye Y.Y., Biswas R., Morris J. R., “A Bastawros and A Chandra, Molecular dynamics simulation of nanoscale maching of copper”, Nanotechnology, vol. 14, pp. 390-396, 2003.
[33]Evgueni C., James B. A., “Molecular dynamics simulations of mechanical deformation of amorphous silicon dioxide during chemical-mechanical polishing”, Journal of Applied Physics, vol. 94, n6, 2003.
[34]Jun Z., James B. A., “Molecular dynamics simulations of asperity shear in aluminum”, Journal of Applied Physics, vol.94, n7, 2003.
[35]許政欽,奈米磨粒在工件上滾動所引發現象之探討:分子動力法分析,國立中山大學機械與機電工程學系,碩士論文,民國92年.
[36]陳道隆,以分子動力學研究奈米級微結構之拉伸、壓縮、扭轉變形機制,國立成功大學機械工程學系,碩士論文,民國90年.
[37]Haile J. M., “Molecular Dynamics Simulation:Elementary Methods”, John Wiely & Sons, Inc., USA, 1992
[38]Miyazaki N., Shiozaki Y., “Calculation of Mechanical Properties of Solids Using Molecular Dynamics Method”, JSME, Series A, vol. 39, n4, 1996.
[39]Girifalco L. A., Weizer V. G., “Application of the Morse Potential Function to Cubic Metals”, Physical Review , vol. 114, n3, 1959.
[40]Imafuku M., Sasajima Y, Yamamoto R., Doyama M., “Computer simulations of the structures of the metallic superlattices Au/Ni and Cu/Ni and their elastic moduli”, J. Phys. F:Met. Phys., vol. 16, pp. 823-829, 1986.
[41]葉哲宜,以分子動力學模擬奈米級量子點之組成,國立成功大學機械工程學系,碩士論文,民國92年.
[42]丁勝懋,雷射工程導論,中央圖書出版社,中華民國92年4月.
[43]Steen W. M., “Laser Material Processing”, Springer-Verlag London Limited 1998, 2nd 2001.
[44]陳俊良,雷射壓印技術之研究,國立成功大學機械工程學系,碩士論文,民國93年.
[45]Li B., Clapp P. C., Rifkin J. A., Zhang X. M., “Molecular dynamics simulation of stick-slip”, Journal of Applied Physics, vol. 90, n6, September 2001.
[46]Incropera F. P., Dewitt D. P., “Fundamentals of Heat and Mass Transfer”, John Wiley & Sons , Inc, 2002.
[47]Carslaw H. S., Jaeger J. C., “Conduction of Heat In Solids”, Oxford University, 1959.