在本文中分成兩部分，分別探討SbCl3在EMIC和CoCl2在TMHC不同陽離子的chloroaluminate離子液體中的電化學行為以及電沉積結果。
第一部分為SbCl3在路易士酸性的AlCl3-EMIC中的電化學行為，如不同掃描速率、溫度的影響、Sb(III)的擴散係數、成核機制及電沉積Sb等，藉由改變溫度、電位、基材，電沉積出具有晶型的金屬態Sb與非晶相的AlSb。第二部分使用路易士酸性的AlCl3-TMHC離子液體，此離子液體在現今的文獻中討論的很少，在此離子液體中用定電位及定電流在不需要模板與添加劑的狀態即可電沉積出線狀與節狀的鋁線，將5% (mole %)的CoCl2加入此離子液體中，探討Co(II)在此系統中的電化學行為以及利用定電位、定電流與脈衝電位的方式來電沉積AlCo合金。三種方法都可以電沉積出AlCo奈米等級的線狀結構，特別的是在脈衝電位的方法中發現可以有像編織物的網狀結構出現，在離子液體中電沉積網狀結構的文獻非常的少，且此方法操作簡單又不需要其他的添加劑與模板輔助即可電沉積出網狀結構的鍍層。電沉積樣品表面形貌、成分與晶型結構以掃描式電子顯微鏡(SEM)、能量分散光譜儀(EDX)、X射線繞射分析儀(XRD)與穿透式電子顯微鏡(TEM)進行觀察及分析。

In this study, the electrochemical behaviors of SbCl3 and CoCl2 were investigated in different AlCl3-EMIC and AlCl3-TMHC Lewis acid chloroaluminate ionic liquids.
The electrodeposition of Sb and AlSb alloys was carried out in the Lewis acidic AlCl3-EMIC containing SbCl3. The crystalline Sb can be obtained at 0.7 V vs Al/Al(III) under 110ºC, and Cu2Sb can be observed when the substrate is Cu foil. The XRD pattern indicates AlSb deposit is amorphous.
The electrodeposition of AlCo alloys was conducted in the Lewis acidic aluminum chloride-trimethylamine hydrochloride (60:40 mole% AlCl3-TMHC) ionic liquid containing 5% CoCl2. The deposition was performed by using constant potential, constant current, and pulse potential electrolysis methods, respectively. For constant potential and constant current electrolysis, the AlCo alloys twisted nanowires were obtained. Interestingly, the AlCo alloys prepared by using pulse potential AlCo alloys were scarf-like structure. All the electrodeposits are characterized by scanning electron microscopy, transmission electron microscopy and X-ray diffractometer.

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