簡易檢索 / 詳目顯示

研究生: 王銘賢
Wang, Ming-Hsien
論文名稱: 含未知時變增益批次間程序之類內模控制設計
Quasi Internal Model Control Design for Run-to-Run Processes with Unknown Time-Variant Gains
指導教授: 黃世宏
Hwang, Shyh-Hong
學位類別: 碩士
Master
系所名稱: 工學院 - 化學工程學系
Department of Chemical Engineering
論文出版年: 2011
畢業學年度: 99
語文別: 中文
論文頁數: 83
中文關鍵詞: 批次程序內模控制架構
外文關鍵詞: Run-to-Run Processes, Internal Model Control
相關次數: 點閱:78下載:1
分享至:
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報
  • 批次間程序常見於半導體製造業中,其模式可用直線方程式來表示,其中截距項代表程序負載,斜率項為程序增益。相對於許多著重於負載擾動影響之研究,本文則探討當增益擾動發生時,批次間程序所受之影響以及相應之強健控制策略。
    本論文首先說明指數加權移動平均(EWMA)及雙重指數加權移動平均(Double EWMA)批次間控制器可分別消除偏移或漂移型態增益擾動所造成的輸出偏位(offset)。另外,更提出類內模控制架構來處理任意型態增益擾動,並指出EWMA及Double EWMA控制器為其兩個特例。接著,該類內模控制設計被簡化為增益擾動預測器的參數設計,在滿足指定公式的情況下,確保達成無偏位輸出並且性能與強韌性均佳的強健批次間控制。
    應用線性化原理,本論文發展出針對不確定量測時延的穩定強韌性判定法。當量測時延誤差為整數時,本法能根據時延邊限指標準確地判斷控制系統穩定性。然而當量測時延誤差為分數時,符合量測時延僅發生在部分批次的實際情況,本法亦可根據實際分數時延與時延邊限的差異性來評估並改善控制系統性能,此分數時延的有效性已由模擬研究獲得證實。

    Run-to-run processes are often seen in semiconductor manufacturing. Their models can be expressed by straight-line equations, where the intercepts represent load disturbances and the slopes denote process gains. Unlike considerable research emphasizing the effects of load disturbances, the thesis investigates the influence of gain disturbances on run-to-run processes and the corresponding robust control strategy.
    The thesis first illustrates that the exponentially weighted moving average (EWMA) and the double exponentially weighted moving average (Double EWMA) run-to-run controller can eliminate the output offset resulting from a gain disturbance of shift type and that of drift type, respectively. Furthermore, a quasi internal model control (IMC) structure is proposed to deal with gain disturbances of any type. It is indicated that the EWMA and the Double EWMA controller are two special cases of the structure. The quasi IMC controller design is then simplified to the parameter design of a predictor for gain disturbances. By satisfying specified formulas, the design can achieve robust run-to-run control that ensures no-offset output as well as good performance and robustness.
    Using the linearization theory, the thesis develops a method to evaluate stability robustness for uncertain measurement delay. When the error of measure delay is an integer, the method could determine the stability of the control system correctly based on the index of delay margin. However, when the error of measure delay is a fraction, corresponding to the practical condition where the measurement delay happens only to a portion of batches, the method could evaluate and improve the performance of the control system based on the distinction between the practical fractional delay and the delay margin. The effectiveness of fractional delay has been verified by simulation study.

    摘要 I Abstract II 誌謝 IV 目錄 V 表目錄 IX 圖目錄 X 符號表 XIII 第一章 緒論 1 1.1 前言 1 1.2 研究動機 2 1.3 論文組織 3 第二章 針對負載擾動之批次間控制理論回顧與模擬 5 2.1 模型簡介 5 2.2 回饋控制架構 6 2.2.1 EWMA控制器 6 2.2.2 Double EWMA控制器 7 2.3 內模控制架構 9 2.4 Adivikolanu內模架構控制器設計 13 2.4.1 一階控制器濾波器設計 13 2.4.2 二階控制器濾波器設計 21 2.4.3 高階控制器濾波器設計 23 2.5 與回饋控制架構比較 24 2.5.1 利用內模控制架構獲得EWMA控制器 24 2.5.2 利用內模控制架構獲得Double EWMA控制器 25 2.6 零點調整之濾波器設計 26 第三章 針對時變增益之批次間控制 31 3.1 模型簡介 31 3.2 回饋控制架構 32 3.2.1 EWMA控制器 32 3.2.2 Double EWMA控制器 33 3.3 類內模控制架構 35 3.4 Adivikolanu類內模架構控制器設計 37 3.4.1 一階控制器濾波器設計 37 3.4.2 二階控制器濾波器設計 38 3.4.3 高階控制器濾波器設計 39 3.5 與回饋控制架構比較 41 3.5.1 利用類內模控制架構獲得EWMA控制器 41 3.5.2 利用類內模控制架構獲得Double EWMA控制器 42 3.6 零點調整之濾波器設計 43 第四章 考量實際狀況之強健設計 47 4.1 增益邊限與時延邊限 47 4.2 開環轉移函數之推導 49 4.2.1 內模控制架構之開環轉移函數推導 49 4.2.2 類內模控制架構之開環轉移函數推導 51 4.3 量測失配 53 4.4 時延邊限選擇 55 第五章 模擬結果與討論 62 5.1 模型介紹 62 5.2 時延邊限選擇 67 5.3 時延變化下之時延邊限選擇 69 5.4 介於型態1和型態2之確定性擾動 75 第六章 結論與未來展望 82 參考文獻

    Adivikolanu, S. and Zafiriou, E., “Internal Model Control Approach to Run-to-Run Control for Semiconductor Manufacturing,” Proceedings of the American Control Conference, Albuquerque, New Mexico, 145-149, 1997.

    Åström, K. J. and Wittenmark, B., Computer Controlled Systems, Prentice Hall, Englewood Cliffs NJ (1984)

    Baxley, R. V., “Applications of the EWMA for Algorithmic Statistical Process Control,” Quality Engineering, 397-418, 1991.

    Bode, C. A., Wang, J., He, Q. P. and Edgar, T. F., “Run-to-Run Control and State Estimation in High-Mix Semiconductor Manufacturing,” Annual Reviews in Control, 241-253, 2007.

    Boning, D. S., Moyne, W. P., Smith, T. H., Moyne, J., Telfeyan, R., Hurwitz, A., Shellman, S. and Taylor, J., “Run by Run Control of Chemical-Mechanical Polishing,” IEEE Transactions on Components, Packaging, and Manufacturing Technology, Part C, 307-314, 1996.

    Box, G. E. and Jenkins, G. M., Time Series Analysis : Forecasting and Control, Holden-Day, Oakland CA (1974)

    Box, C. E. P. and Kramer, T., “Statistical Process Control and Automated Process Control-A Discussion,” Technometrics, 251-267, 1992.

    Braun, M. W., Jenkins, S. T. and Patel, N. S., “A Comparison of Supervisory Control Algorithms for Tool/Process Disturbance Tracking,” Proceedings of the American Control Conference, Denver, 2626-2631, 2003.

    Chien, I. L. and Fruehauf, P. S., “Consider IMC Tuning to Improve Controller Performance,” Chemical Engineering Progress, 33-41, 1990.

    Chen, A. and Guo, R. S., “Age-Based Double EWMA Controller and Its Application to CMP Process,” IEEE Transactions on Semiconductor Manufacturing, 11-19, 2001.
    Chiu, J. B., Su, A. J. and Yu, C. C., “Planarization Strategy of Cu CMP Interaction between Plated Copper Thickness and Removal Rate,” Journal of the Electrochemical Society, 217-222, 2004.

    Firth, S. K., Campball, W. J., Toprac, A. and Edgar, T. F., “Just-in-Time Adaptive Disturbance Estimation for Run-to-Run Control of Semiconductor Process,” IEEE Transaction on Semiconductor Manufacturing, 298-315, 2006.

    Garcia, C. E. and Morari, M., “Internal Model Control. 1. A Unifying Review and Some New Result,” Industrial and Engineering Chemistry Process Design and Development, 308, 1982.

    Good, R. and Qin, S. J., “Stability Analysis of Double EWMA Run-to-Run Control with Metrology Delay,” Proceedings of the American Control Conference, Anchorage, 2156-2161, 2002.

    Hanish, C. K., “Run-to-Run State Estimation in System with Unobservable States,” Annual Reviews in Control, 241-253, 2007.

    Hu, A., Zhang, X., Sachs, E. and Penteln, P., “Application of Run by Run Controller to the Chemical-Mechanical Planarization Process, Part I,” Proceedings of IEEE 15th International Electronics Manufacturing Technology Symposium, 235-240, 1993.

    Hu, A., Dun, H. P., Renteln, P. and Sachs, E., “Sensor Development and Process Control for Chemical-Mechanical Planarization of Multilevel Interconnect Device,” Electrochemical Social Meeting, 87-96, 1995.

    Hunter, J. S. “The Exponentially Weighted Moving Average,” Journal of Quality Technology, 203-210, 1986.

    Ingolfsson, A., “Run by Run Process Control,” M.S. Thesis, Electrical Engineering, Department, MIT, 1991.

    Moyne, W., “Run by Run Control: Interfaces, Implementation, and Integration,” M.S. Thesis, Electrical Engineering and Computer Science, MIT, 1995.

    Patel, N. S. “Robust Control of Set-Value Discrete Time Dynamical Systems” Dissertation, University of Maryland, 1995

    Sachs, E., Hu, A. and Ingolfsson, A., “The Run by Run Controller User’s Manual Version 1.0,” M.S. Thesis, Mechanical Engineering, MIT, 1991.

    Sachs, E., Hu, A. and Ingolfsson, A., “Run by Run Process Control: Combining SPC and Feedback Control,” IEEE Transactions on Semiconductor Manufacturing, 26-43, 1995.

    Stefani, J. and Butler, S. W., “Real-Time Inference of Plasma Etch Uniformity Using In Situ Ellipsometry,” Symposium on Highly Selective Dry Etching and Damage, Spring Electrochemical Society Meeting, Honolulu, Hawaii, 35-46, 1992.

    Stefani, J. and Butler, S. W., “Application of Predictor Corrector Control to Polysilicon Gate Etching,” Proceedings of the American Control Conference, San Francisco, California, 3003-3007, 1993.

    Sua, A. J., Jenga, J. C., Huanga, H. P., Yua, C. C., Hungb, S. Y. and Chaoc, C. K., “Control Relevant Issues in Semiconductor Manufacturing: Overview with Some New Results,” Control Engineering Practice, 1268-1279, 2007.

    Tseng, S. T., Chou, R. J. and Lee, S. P., “Statistical Design of A Double EWMA Controller,” Applied Stochastic Models in Business and Industry, 313-322, 2002.

    Zafiriou, E. and Morari, M. “Digital Controllers for SISO System, A Review and a New Algorithm,” International Journal of Control, 855-876, 1985.

    Zafiriou, E. and Morari, M., Robust Process Control, Prentice Hall, Englewood Cliffs NJ (1989)

    下載圖示 校內:立即公開
    校外:立即公開
    QR CODE