本研究開發一種創新奈米壓印系統與壓印方法，利用紫外光固化之奈米壓印技術，搭配環狀氣壓缸控制壓力，與複合可撓性模具。可應用於圖案化藍寶石基板 (Pattern Sapphire Substrate, PSS)、抗反射結構(Moth’s-Eye)、複合模壓印、光通結構…等製程。實驗中利用PVA搭配可撓式PDMS模具的柔軟特性，能完整貼附於翹曲基板上，並在脫模時，能保護基板上的結構，提升奈米壓印良率問題以及在產業上的可行性。另外，奈米壓印製程中，對於光阻的塗佈大多數以旋塗為主，殘留在壓印過程影響蝕刻很大的因素，固在面對塗行不規則的模仁時，利用旋塗方法往往會在非體基置換率區有著很厚一層模厚。本文成功利用旋塗進行結構壓印複製在四吋基板上，並且對於非體基置換區的殘留層模厚進行分析，同時液滴壓印也能達到節省膠材不必要的浪費就能完成壓印製程。
本文分別利用旋塗與液滴方式搭配環行壓印機台，成功在基板上壓出周期性與非週期性結構，周期性結構尺寸為線寬150 nm、高度200 nm、周期300 nm，非週期性模仁尺寸分成四個種周期 0.8 µm、1.2 µm、1.6 µm、2.4 µm，同時也利用陽極氧化鋁反應製作出解析度小於100 nm的錐狀結構，並用液滴壓印將結構轉移至四吋基板上。

This thesis develops an innovative nanoimprinting system and imprinting method, which uses ultraviolet (UV) nanoimprint technology, with annular pneumatic cylinder and composite flexible mold to control pressure. This imprinting system can be applied to pattern sapphire substrate (PSS), anti-reflection structure (Moth’s – Eye), composite imprint, and so on. The experiment utilizes the softness of the flexible mold and the water-soluble of mold, and these characteristics can make specimen be attached to the warpage substrate completely. When the mold is released, the structure on the substrate can be protected. The yield rate of nano-imprint and the feasibility in the industry will be improved. In the nanoimprinting process, the coating of the photoresist is mostly based on spin coating, and the residual embossing process affects the etching factor so that the region of non-value replacement rate zone tends to have a thick layer when the irregular mold is coated. In this thesis, the structure is successfully imprinted on the 4” substrate by spin coating and the residual layer thickness of the non-body-based replacement area is analyzed. At the same time, the drop-imprinting can also save the unnecessary waste of the glue in printing process.
The thesis makes use of the spin-coating method and the droplet method to match the circular imprinting machine, and the periodic and non-periodic structures are successfully imprinted on the substrate. The periodic structure has a line width of 150 nm, a height of 200 nm, and a period of 300 nm. On the other hand, the irregular structure is four kinds of periods which are 0.8 μm, 1.2 μm, 1.6 μm, and 2.4 μm respectively. Besides, a tapered structure with a resolution of less than 100 nm is fabricated by anodizing the aluminum oxide, and the structure is transferred to the 4” substrate by drop-imprinting.

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