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研究生: 陳有錡
Chen, You-Chi
論文名稱: 可用於高溫一氧化碳氣體感測的新型奈米柱狀結構鈀/金屬氧化物/鑽石薄膜/正型-矽基板PIN二極體之研製
The Study Of A Novel Pd/MOX/Diamond /P-Si PIN Diode With All Nanorods Structure For High Temperature CO Sensing Applications
指導教授: 方炎坤
Fang, Yean-Kuen
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2011
畢業學年度: 99
語文別: 中文
論文頁數: 152
中文關鍵詞: 一氧化碳感測器奈米柱鑽石薄膜金屬氧化物
外文關鍵詞: CO, Sensor, Nanorods, Diamond, MOx
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  • 本論文研究利用硝酸銀及氫氟酸之蝕刻溶液於P型(100)矽基板上形成奈米柱狀結構。然後使用甲烷與氫氣及利用具有高沉積速率與能提供大量氫自由基特性的電場輔助熱鎢絲化學氣相沉積法(Bias-assisted HWCVD) 在奈米柱狀結構的矽基板成長非晶奈米鑽石薄膜。再濺鍍上各種不同的金屬氧化物(ZnO、SnO2、WO3等)作為感測層。最後蒸鍍鈀作為催化劑及電極,並在背面鍍上鋁金屬完成一氧化碳感測器。
    吾人利用Raman、XRD量測原子間的鍵結與薄膜結晶; SEM與AFM觀察表面結構與粗糙度及HP4145半導體量測分析儀進行元件I-V量測。利用電場輔助所沉積的奈米鑽石薄膜具有較高的崩潰電壓、高能隙,及較高的熱導率,故可以操作在較高的溫度。
    實驗結果顯示,奈米柱狀結構增加了感測器與氣體的接觸面積,因此也相對提升了感測器的靈敏度。相較於未使用奈米柱狀結構者,其靈敏度由304%提升至797%。另外,在三種不同的金屬氧化物中,以WO3當感測層者,不論是在低或高濃度的一氧化碳都有最佳的表現: 例如在100℃,3V逆偏壓及100ppm的CO的環境下,其靈敏度為53%,在300℃,3V逆偏壓及3000ppm的CO的環境下,其靈敏度提高為3700%。且擁有良好的再現性反應。反應時間約為6秒。相較於已發表文獻在260℃/3500ppm 條件下Au/WO3/ SiN /Si MIS Schottky diode 的108%為佳。除外,對於其他氣體的選擇性感測也有很好的效果。

    In this thesis, firstly the P (100)-Si substrates were etched by AgNO3 mixed HF solution to form nanorod structure. Then we deposited Pd/MOX/diamond thin films sequentially on the nanorod to develop all nanorod structure PIN Schottky diode for high sensitivity CO gas sensing under high temperature applications. A bias-assisted hot-wire chemical vapor deposition (HWCVD) system was applied to prepare the diamond film from H2 and CH4 gas mixture for getting better quality film, and thus the higher breakdown voltage and thermal stability. Besides, we analyze the diamond film quality using Raman, XRD, SEM and AFM, respectively for bond structure measurement, analyzing, crystallinity, examination of surface roughness as well as morphology.
    Experimental results show that with and without the nanorod structure, the sensitivity can be enhanced from 304% to 797%. Besides, three metal oxides (ZnO, SnO2, WO3) are chosen as the sensing element. Among them, the WO3 can get the shorter response time of 6 sec, good reproducibility and the highest sensitivity of 131% and 3700% respectively for 100ppm and 3000ppm CO ambient with the condition of - 3V, 300℃. The sensitivities are better than that of 108% for the reported Au/WO3/ SiN /Si MIS Schottky diode under condition of 260℃/3500ppm. Besides, the sensor with WO3 does not sense to CO2 and alcohol gas.

    摘要 III Abstract V 第一章 導論 1 1-1前言 1 1-2氣體感測器 2 1-3一氧化碳特性 3 1-4鑽石薄膜應用 4 1-5無電鍍金屬觸發感應蝕刻奈米柱結構 5 1-6論文架構 6 第二章 理論基礎 7 2-1元件基礎理論 7 2-2感測器工作原理 9 2-2-1 氧氣的吸附作用 10 2-2-2 氧空缺(Oxygen Vacancy)的傳導機制 12 2-2-3 CAIS結構(catalyst / Metal Oxide(adsorptive oxide) / i(intrinsic)-diamond / p+-diamond / substrate) 13 2-3蝕刻奈米柱狀結構之機制及原理 14 第三章 實驗與量測儀器和製程步驟 16 3-1 HWCVD特性 16 3-2影響非晶鑽石薄膜的參數 19 3-3一氧化碳感測器相關製程技術 23 3-3-1 真空蒸著系統(Thermal Vacuum Evaporation System) 23 3-3-2 射頻磁控濺鍍系統(Radio-Frequency Sputtering System) 24 3-4量測儀器 26 3-4-1場放射型掃描式電子顯微鏡 (Field Emission Scanning Electron Microscope , FE-SEM) 26 3-4-2膜厚量測儀 (α-Step) 27 3-4-3 X光繞射儀(X-ray Diffractometer, XRD) 27 3-4-4 傅立葉轉換紅外線光譜儀(Fourier transform infrared spectroscopy , FTIR) 29 3-4-5 拉曼光譜儀(Raman Spectroscopy) 29 3-4-6 氣體感測量測系統 30 3-4-7 HP4145B半導體參數分析儀 30 第四章 結果與討論 31 4-1奈米鑽石薄膜分析 31 4-1-1 甲烷CH4流量對薄膜特性之影響 31 4-1-2 H2對薄膜特性之影響 32 4-1-3 基板偏壓對薄膜特性之影響 33 4-2蝕刻奈米柱狀結構 35 4-2-1蝕刻奈米柱狀結構之製程步驟 35 4-2-2蝕刻奈米柱狀結構分析 36 4-3元件製作與特性量測 37 4-3-1元件結構及製程步驟 37 4-3-2感測層薄膜厚度之一氧化碳感測器分析 38 4-4奈米柱狀結構一氧化碳感測器分析 39 4-4-1奈米柱狀結構一氧化碳感測器分析 40 4-4-2感測溫度對WO3奈米柱狀結構一氧化碳感測器之分析 41 4-4-3本質層厚度對一氧化碳感測器之分析 44 4-5感測層材料對一氧化碳感測器之影響 48 4-5-1 Pd/ZnO/i-Diamond/P-Diamond/P-Si結構之元件 49 4-5-2 Pd/SnO2/i-Diamond/P-Diamond/P-Si結構之元件 51 4-5-3 Pd/WO3/i-Diamond/P-Diamond/P-Si結構之元件 53 4-5-4綜合討論 56 第五章 結論與未來展望 60 5-1結論 60 5-2未來展望 61 ※參考文獻 62

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