週期性金屬結構因具有特殊光學性質，而有許多用途，因此一直是熱門的研究領域，其製作也有多種方式，這裡我們希望利用簡單、便宜又快速的方式來製作週期性金屬結構，並將其應用於表面電漿折射率感測器的量測上。
文中我們使用的製作方式為，先利用便宜、架構簡單且可調性高的Lloyd’s mirror 干涉儀架構，曝光光源為325 nm的氦鎘雷射，進行一維及二維的曝光，再使用熱蒸鍍機沈積金屬及舉離製程，製做出一維及二維金屬結構。其製程分別使用AZ-5214的正型光阻及SU-8負型光阻。AZ-5214製程包含於玻璃基板進行正向與背向曝光，在背向曝光上能製作出週期650 nm，線寬450 nm，高度為80 nm的金屬線，AZ-5214於矽基板分別使用犧牲層及未使用犧牲層之製程。而SU-8因其為環氧樹脂光阻，在曝光後不易去除，因此需增加一犧牲層，這裡分別使用了Omni coat及PVA做為犧牲層，並透蝕刻、沈積金屬及舉離來製作出一維及二維金屬週期性結構。在使用PVA為犧牲層的製程上，我們可製作出週期500 nm，點陣列為250 nm-350 nm，厚度為30 nm-50 nm的結構。
我們將所製作的橢圓銀點陣列結構，應用於環境折射率感測上，並使用相位檢測法來提升折射率感測上的FOM。在週期為500 nm，厚度為30 nm的銀橢圓點陣列上，使用相位量測法相較於強度量測法可提升FOM值約3.76倍。

關鍵字：干涉式微影、一維及二維週期性金屬結構、折射率感測。

Recently, there has been interest in the fabrication of nanoscale periodic structures. Because these structures have many applications. In this work, we report on the fabrication of one- and two-dimensional periodic metallic structures by the Lloyd’s mirror interference lithography. The patterns is written in the photoresist AZ-5214 or SU-8 using a He-Cd laser of wavelength 325nm. Then we deposit the metal by electron beam evaporator and use the lift-off process. We successfully fabricate one- and two-dimensional periodic metallic structure with periodic of 500 nm-700 nm and metal thickness of 30nm-80nm. And we fabricate the Ag ellipse nanostructures on application of refractive index sensor. Phase sensitive measurement can boost figure-of-merit than intensity sensitive measurement. In this work, we can boost 3.76 order.

Key words: Interference lithography, one- and two-dimensional periodic metal structure, refractive index sensor.

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