在本篇論文中，主要研究奈米壓印微影技術，包括熱壓式奈米壓印、紫外光硬化奈米壓印和軟微影。藉由物理的方式成型，必須在模具和基板之間緊密的接觸。要得到不錯的均勻圖形，一個均勻作用力覆蓋在整個壓印的區域是必要的。因此，建置氣壓式微奈米壓印平台，能提供更均勻的壓力，配合h-/184 PDMS雙層結構低表面能且複製能力高的特性，提高脫模的效率。
研究中發現當線寬尺寸小於1 um時，184 PDMS的複製能力會漸漸變差，為了得到不錯的圖形保真度，必須改用楊氏模量較高的h-PDMS來進行複製，而因為單層h-PDMS容易碎裂，所以改以h-/184 PDMS雙層結構來複製。當壓力大於3 bar和溫度大於130℃，會產生無殘餘層的結果。在我們壓印機台中使用h-/184 PDMS軟模具，其壓印的壓力是很小的。
此外，直接壓印金屬奈米壓印是更進一步的發展，應用在製作金屬金字塔陣列。在母模的製作中，透過KOH對矽基板特定晶格面蝕刻的特性，成型出矽基板倒金字塔陣列，接著藉助紫外光奈米壓印微影，進而製作出h-/184 PDMS的倒金字塔陣列。藉著直接壓印金屬奈米粒子可成功得到週期2 um和邊長1 um金的金字塔陣列。

In the thesis, nanoimprint lithography was mainly investigated, including hot embossing nanoimprint lithography, ultraviolet cured nanoimprint lithography and soft lithogtraphy. In nanoimprint lithography, resist patterns are created by physically deforming the resist material with a mold. Therefore, it requires an intimate contact between the mold and substrate. An uniformly applied force over the entire imprint region is necessary to have good pattern uniformity. Thus, we built up a micro/nano imprint platform with conformable gas press. It can provide more uniform imprint pressure. Meanwhile, using h-/184 PDMS composite stamp with low surface energy provides good capability of replication and promotes an efficient demolding.
In our study, it was found that the replicating capability of 184 PDMS become poor when the dimension of the line pattern is smaller than 1 um. To have good pattern fidelity, the h-PDMS, which has higher modulus, was employed as the imprint stamp. To overcome the cracking problem of h-PDMS when releasing from the master, a bilayer scheme, h-/184 PDMS composite, was utilized as our imprint stamp. There is almost no residual layer, when imprinting pressure is above 3 bar and embossing temperature is above 130℃. The imprinting pressure is relatively small when using bilayer h-/184 PDMS stamp in our imprint machine with a conformable gas press.
Moreover, direct nanoimprinting of metallic nanoparticles was further developed and then applied to fabricate metallic pyramid array. In the master mold fabrication, the inverse-pyramid hole arrays were formed by the <111>crystalline planes of the (100) silicon wafer using anisotropic KOH wet etching of silicon. After stamp replication processes with ultraviolet nanoimprint lithography, the inverse-pyramid hole arrays of h-/184 PDMS composite stamp were finally fabricated. By using direct nanoimprinting of metallic nanoparticles with the h-/184 PDMS composite stamp, the gold pyramid array with a period of 2 um and pyramidal edge length of 1 um have been fabricated.

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