本實驗的目的在於研究一矽質微流道，利用硝酸銀溶液蝕刻出矽奈米線，使得微流道底部形成超親水表面，完成親水性微流道，再使用過氟庚基三氯矽烷汽化至微流道親水表面使之翻轉為超疏水表面，完成疏水性微流道。
量測的部分將壓力感測器埋設在微流道的入口端，可詳細的記錄流道內壓力隨時間變化的曲線圖，5條熱偶合線以等距的方式埋設在流道底部藉以記錄不同流量與不同熱通量條件下流道的壁面溫度分佈圖，另外使用影像擷取設備，拍下流道內之流譜圖，觀察親疏水微流道內的流場與氣泡成核現象。
製程方面使用感應式耦合電漿蝕刻系統(ICP)，以分段式蝕刻確保微流道的準直性，流道的長為30mm、寬為1000μm、高為100μm，水力直徑Dh=181.82μm，並在微流道底部以硝酸銀及氫氟酸的溶液蝕刻出奈米線，陽極接合部分則是採用與矽膨脹係數相近的Pyrex 7740玻璃，加熱後施加一壓力與電壓進行接合。

The goal of this study is to develop a silicon micro-channel system,
use AgNO3 etch SiNWS, making micro-channel bottom super hydrophilic, achieve hydrophilic micro-channel, and hydrophobic material was deposited at the bottom, reverse it to super hydrophobic surface , complete the hydrophobic micro-channel.
To messure the test section, set the pressure sensor at the micro-channel inlet, it can take down the pressuer in the channel, and five thermocouple set as same distance in the bottom of channel to take down tempureture distribution in different condition, and use CCD system, take down the pattern in the channel, observe the flow map and bubble nucleation in hydrophilic and hydrophilic micro-channel.
In the processes of fabrication, the rectangular micro-channel in the (100) silicon wafer were fabricated by the Inductive Couple Plasma Etcher system. These micro-channel, a length of 30mm, a width of 1000μm and depth of 100μm, had on identical rectangular cross-section with a hydraulic diameter of 181.82μm and successfully use nanostructures with the AgNO3 solution etch silicon nanowire in micro-channel which anodic bonding with Pyrex 7740glass.

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