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研究生: 王靖宇
Wang, Ching-Yu
論文名稱: CuInSe2蕭特基二極體與β-Ga2O3蕭特基二極體之研究
Fabrication of CuInSe2 Schottky diode and β-Ga2O3 Schottky diode
指導教授: 洪茂峰
Houng, Mau-Phon
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2020
畢業學年度: 108
語文別: 中文
論文頁數: 100
中文關鍵詞: 蕭特基二極體電鍍二硒化銅銦液相沉積法β型氧化鎵
外文關鍵詞: Schottky diode, CuInSe2, Electrodeposition, β-Ga2O3, LPD
相關次數: 點閱:171下載:50
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  • 本研究共分為兩部分,第一部分為CuInSe2蕭特基二極體,第二部分為β-Ga2O3蕭特基二極體。
    CuInSe2部分,本論文在鉬玻璃基板上以電鍍方式製備CuInSe2薄膜,透過調變工作電壓、pH值與抑制電壓,成功製備化學劑量比接近1:1:2且形貌平坦的CuInSe2薄膜。後續進行退火改善結晶度並調變退火的升、降溫速率,減少薄膜表面因熱應力產生的裂縫,再以KCN蝕刻消除二次相雜質,改善薄膜品質。在CuInSe2薄膜上方鍍上Al做成蕭特基二極體,透過特意降低工作電壓,提升薄膜銅含量的方式,改善CuInSe2蕭特基二極體的電性,最佳參數為理想因子1.761,蕭特基位障0.699V。
    β-Ga2O3部分,以液相沉積法製備氧化鎵的前驅物-GaOOH晶粒,透過調變成長溫度與溶液pH值,改變晶粒形貌與晶粒大小。經過多次清洗過濾後,將含有GaOOH晶粒的沙漿滴在事先鍍上Au/Ti背電極的氧化鋁基板上,透過退火令GaOOH轉變為Ga2O3,調變退火溫度與持溫時間獲得完整轉化β-Ga2O3晶粒。最終鍍上Ni/Au作為蕭特基金屬進行量測,得理想因子為8.657、蕭特基能障為0.93V。

    This thesis is divided into two parts. The first part is the fabrication of the CuInSe2 Schottky diode, and the second part is the fabrication of the β-Ga2O3 Schottky diode.
    In the CuInSe2 part, electrodeposition was chose to fabricate CuInSe2 thin film. By adjusting working voltage(Von), suppression voltage (Voff) and pH value, the near stoichiometry and flat thin film was successfully fabricated. Next, RTA process was taken to improve the crystallinity. To reduce the crack caused by thermal stress, the heating rate and the cooling rate were adjusted. Next, KCN etching process was introduced to eliminate CuxSe secondary phase. Finally, plate Al contact on CuInSe2 thin film to make Schottky diode. By consciously reduce Von to increase Cu content in the CuInSe2 thin film, the electrical property of CuInSe2 SBD is increased. Best ideal factor and Schottky barrier height is 1.085 and 0.699V, respectively.
    In the β-Ga2O3 part, Liquid Phase Deposition(LPD) was introduced to fabricate GaOOH particles, which is the precursor of β-Ga2O3. By adjusting the pH value and the temperature of solution, different morphology and grain size GaOOH were produced. After several washes and filters, clean particles dropped on the sapphire substrate, which has plated Au/Ti as back contact. Next, the annealing process was adopted to transfer GaOOH into β-Ga2O3. By adjusting temperature and annealing time, we can make sure that almost all the GaOOH particles are transferred. Finally, plate Ni/Au contact on the β-Ga2O3 thin film to make Schottky diode. Best ideal factor and Schottky barrier height is 8.657 and 0.93V, respectively.

    摘要 III 誌謝 XI 目錄 XIII 表目錄 XVII 圖目錄 XIX 第一章 緒論 1 1-1 前言 1 1-2 CISe材料簡介 3 1-3 功率元件簡介 4 1-4 β-Ga2O3材料簡介 5 1-5 研究動機 8 第二章 理論基礎與文獻探討 10 2-1 金屬半導體接觸理論 10 2-1-1 蕭特基接觸 11 2-2 CISe材料 19 2-2-1 CISe特性介紹 19 2-2-2 CISe製備方式介紹 22 2-2-3 化學組成比例 24 2-3 電化學沉積介紹 26 2-3-1 系統介紹 26 2-3-2 電化學沉積晶體之結晶成長過程介紹 28 2-3-3 影響電鍍的主要因素 29 2-4 氧化鎵材料 32 2-4-1 氧化鎵材料特性簡介 32 2-4-2 氧化鎵製備方式 33 2-4-3 液相沉積法製備氧化鎵 34 第三章 實驗方法與儀器介紹 37 3-1 實驗方法 37 3-1-1 實驗流程 37 3-1-2 CISe蕭特基二極體製備步驟 38 3-1-3 β-Ga2O3蕭特基二極體製備 44 3-2 實驗製程設備 48 3-2-1 實驗藥品 48 3-2-2 電子束蒸鍍機 50 3-2-3 熱處理設備 51 3-3 實驗量測設備 53 3-3-1 場發射掃描式電子顯微鏡(FE-SEM) 53 3-3-2 能量分析光譜儀(Energy Dispersive Spectrometer ; EDS) 54 3-3-3 X光繞射儀(X-Ray Diffractometer ; XRD) 55 3-3-4 拉曼光譜儀(Raman Spectrometer) 57 第四章 結果與討論 59 4-1 實驗架構 59 4-2 CISe薄膜參數調變 60 4-2-1 CISe電鍍參數調變 60 4-2-2 CISe退火參數調變 67 4-2-3 氰化鉀(KCN)蝕刻 71 4-3 β-Ga2O3薄膜參數調變 74 4-3-1 pH調變 75 4-3-2 成長溫度調變 77 4-3-3 α-Ga2O3退火時間調變 81 4-3-4 β-Ga2O3退火時間調變 83 4-4 電性分析 85 4-4-1 CISe/β-Ga2O3 MIS結構製程難題 85 4-4-2 CISe蕭特基電性分析 87 4-4-3 β-Ga2O3蕭特基電性分析 91 第五章 結論 94 第六章 未來工作 95 參考文獻 97

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