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研究生： 林建勳
Lin, Jian-Shiun
論文名稱： Pt及B之添加Co-Cr磁性薄膜性質之研究
The effect of addition Pt and B to Co-Cr magnetic thin film
指導教授： 張炎輝
Chang, Yen-Hwei
學位類別： 碩士
Master
系所名稱： 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年： 2003
畢業學年度： 91
語文別： 中文
論文頁數： 107
中文關鍵詞： 鈷鉻 、磁記錄
外文關鍵詞： Co-Cr, Magnetic Recording
相關次數： 點閱：77  下載：1 
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    • 本研究以不同比例的Co、Cr熔製成靶材，以貼Pt、B片方式製作成複合靶，利用直流或射頻磁控濺鍍法，直接鍍在矽基板，製備不同成份比例的Co-Cr、Co-Cr-Pt、Co-Cr-Pt-B合金薄膜。
    利用EDS、ICP-MS分析薄膜元素組成，以XRD作結構分析，SEM、TEM觀察微結構，SQUID作磁性質的量測。
    探討不同比例的Co-Cr合金薄膜，以及不同添加量的Pt與B對Co-Cr薄膜之微結構變化與磁性質之影響。
    實驗結果顯示，在Co-Cr17.5at%左右矯頑磁力Hc可得到較佳的值，而添加12~15at%的Pt可改善Co-Cr合金的矯頑磁力，添加B雖然會降低矯頑磁力，但會使晶粒細化。

    In this experiment, different composition of Co-Cr alloy targets is prepared by high frequency furnace. The magnetic thin film is coated directly on Si substrate at 300℃ by DC/RF magneto sputter. Various contents of Co-Cr, Co-Cr-Pt, and Co-Cr-Pt-B alloy thin films are prepared.
    The ratio of elements in the samples is measured by EDS and ICP-MS. The structure is analyzed by XRD. Surface morphology and microstructure is observed by SEM and TEM. Magnetic properties is determined by SQUID.
    It has been discussed that different Cr contents and adding Pt and/or B to Co-Cr alloy thin film will change its magnetic properties and microstructure.
    In the results, the coercivity Hc is better for Cr content at 17.5at%. Adding 12~15at% Pt to Co-Cr thin film will promote magnetic properties. Adding B, the grain size will be smaller and Hc will decrease.

    摘 要.........................I Abstract......................II 目 錄.......................III 圖 目 錄.....................VII 表 目 錄....................VIII 第 1 章 緒論...................1 1-1 前言.......................1 1-2 研究動機...................2 第 2 章 文獻回顧與理論基礎 ....4 2-1 磁力矩的來源...............4 2-2 鐵磁性.....................5 2-3 磁滯現象...................5 2-4 磁記錄簡介.................9 2-5 水平記錄與垂直記錄.........9 2-6 磁記錄材料................12 2-7 Co-Cr系合金薄膜...........13 第 3 章 實驗方法..............21 3-1 實驗流程..................21 3-2 靶材製作..................22 3-3 基板準備..................24 3-4 濺鍍薄膜..................25 3-4-1 Co-Cr合金膜.............25 3-4-2 Co-Cr合金膜添加Pt.......27 3-4-3 Co-Cr合金膜添加Pt與B ...28 3-5 成份分析..................29 3-5-1 EDS分析.................29 3-5-2 ICP-MS分析..............29 3-6 X光繞射分析...............29 3-7 電子顯微鏡分析............30 3-7-1 掃描式電子顯微鏡(SEM)...30 3-7-2 截面量測厚度............30 3-7-3 穿透式電子顯微鏡(TEM)...30 3-8 磁性量測..................31 第 4 章 結果與討論............32 4-1 Co-Cr合金膜的探討.........32 4-1-1 Co-Cr成份分析...........32 4-1-2 XRD分析.................34 4-1-3 SEM探討.................37 4-1-4 TEM探討.................41 4-1-5 磁性質探討..............44 4-2 添加Pt對Co-Cr的影響.......47 4-2-1 成份分析................47 4-2-2 XRD分析.................50 4-2-3 SEM探討.................53 4-2-4 TEM探討.................64 4-2-5 磁性質探討..............68 4-3 添加B對Co-Cr的影響........78 4-3-1 成份分析................78 4-3-2 XRD分析.................78 4-3-3 SEM探討.................80 4-3-4 TEM探討.................82 4-3-5 磁性量測................84 4-4 Co-Cr添加Pt與B的影響......87 4-4-1 成份分析................87 4-4-2 XRD分析.................88 4-4-3 SEM探討.................90 4-4-4 TEM探討.................97 4-4-5 磁性質探討..............99 第 5 章 結論.................103 參考文獻.....................104

    1. S.Iwasaki & K. Takemura, ” An analysis for the circular mode of Magnetization in short wavelength recording”, IEEE Trans. Magn. MAG-11,p1173(1975)

    2. T.P. Nolan, Y. Hirayama, M. Futamoto, ”Improvement of Co71Cr19Pt10/Ti90Cr10 perpendicular recording media by independent optimization of film nucleation and growth processes”, J. Appl. Phys. 79(1996) 5359.

    3. I.S. Lee, H. Ryu, H.J. Lee, T.D. Lee, “Role of a paramagnetic amorphous CoZr seed layer in CoCrPt/Ti perpendicular recording media”, J. Appl. Phys. 85(1999) 6133.

    4. H. Gong, M. Rao, D.E. Laughlin, D.N. Lambeth, “Highly oriented perpendicular Co-alloy media on Si(111) substrates”, J. Appl.Phys. 85 (1999) 4699

    5. S.Iwasaki & H.Yamazaki, Proc 7 the Ann Conf. On Magnetism ,4PA-7(1975)

    6. T.Keitoku, J.Ariake, N.Honda, K.Ouchi, S.Iwasaki, “Addition of third elements to Co-Cr media”, J.Magn.Magn.Mater. 176, (1997)p25-30

    7. Y.Shiroishi,Y.Hosoe,A.Ishikawa,Y.Sugita, ” Magnetic and atomic order in dilute Pd and Pt based alloys”, J.Appl.Phys.73(1993)5569

    8. M.Naoe,M.Matsuoka,Y.Hoshi, “Effect of additional element (Fe, Zr, Ta) for Co-Cr films deposited by targets facing type of sputtering”, J.Appl.Phys.57(1985)4019

    9. Willam D. Callister Jr.,,“Material Sceince & Engineering an Introduction,4th ed, (1997)p660-682

    10.近角聰信撰 ; 張煦, 李學養譯, “磁性物理學”, 聯經,1982

    11.鄭振東, “實用磁性材料”, 全華圖書公司,1999

    12.National Semiconductor ,Mass Storage Handbook, 1989

    13.金重勳,郭博成,郭志明,磁性技術手冊,台灣磁性技術協會(2000),191-197

    14. J.C.Lodder, “Magnetic structures in Co-Cr media for perpendicular magnetic recording”, J.Magn.Magn.Mater.,159(1996)238-248

    15. Shun-ichi Iwasaki, “Discoveries that guided the beginning of perpendicular magnetic recording”, J.Magn.Magn.Mater. , 235(2001)227-234

    16.林志銘,”台灣磁性技術協會會訊”,35期(2003)29-33

    17. K.O'Grady, H. Laidler , “The limits to magnetic recording — media considerations”, J.Magn. Magn.Mater. 200 (1999) 616-633

    18. G.Bate, “Oxides for magnetic recording in Magnetic oxides” , by D.J.Craik, (1975)p.689

    19. G.Bate, “Recording materials, in Ferromagnetic materials” ,by E.P.Wobifarth, (1980)p.381

    20. S.Iwasaki & H.Yamazaki,Proc.7 the Ann.Conf. on Magn., (1975)4PA-7

    21. K.Hono.Maeda, S.Babu, J.Li & T.Suzuki , “APFIM studies of compositional inhomogeneity in sputtered Co-Cr thin films”, IEEE Trans.Magn.29(1993)3745

    22. T.Yogi & T.A.Nguyen, “Ultra high density media: gigabit and beyond”, IEEE Trans. Magn. 29(1992)307

    23. D.J.Rogers, J.N.Chapman, J.P.C.Bernards & S.B.Luitjens, “Determination of local composition in Co-Cr films deposited at different substrate temperatures”, IEEE Trans. Magn.25(1989)4180

    24. M.E.Mchenry, D.E.Laughlin, “Nano-scale materials development for future magnetic applications”, Acta Mater. 48(2000)223

    25. Toshiaki Keitoku, Jun Ariake, Naoki Honda, Kazuhiro Ouchi, "Preparation of Co–Cr–Pt alloy film with high perpendicular coercivity and large negative nucleation field " , J.Magn.Magn.Mater. 235 (2001)34-39

    26. H.Suzuki, P.R.Bissell, R.W. Chantrell, N. Kodama, "In-plane remanence and microstructure in Co—Cr—Ta thin films" , J.Magn.Magn.Mater. 148 (1995) 11-12

    27. M.Naili, G.Suran, “Mechanism governing the formation and the magnitude of the induced magnetic anisotropy Ku in amorphous Co-Zr-M (M=Zr, Nb, Ti) and Co-Zr-Pt thin films”, J.Appl.Phys. 76(1994)1141

    28. K.Oikawa, G.W.Qin, O.Kitakami, Y.Shimada, K.Fukamichi and K.Ishida, “Prediction of effective elements for magnetically induced phase separation in Co–Cr-based magnetic recording media” ,J.Appl.Phys.Lett. 79(2001)644

    29. G.W.Qin, K.Oikawa, T.Ikeshoji, R. Kainuma, K.Ishida, “Magnetically induced phase separation in the Co–Cr binary system”, J.Magn.Magn.Mater. 234(2001)1

    30. Katsunari Oikawa, Gao-Wu Qin, Tamio Ikeshoji, Ryosuke Kainuma,yohito Ishida, “Phase stability of the X2AlTi (X: Fe, Co, Ni and Cu) Heusler and B2-type intermetallic compounds”, Acta Mater. 50(2002)2223

    31.莊達人,”VLSI製造技術”,160,高立出版社

    32.楊錦江譯, ”基礎濺鍍電漿,電子發展月刊68期”,p13-40(1983)

    33.賴耿陽,”IC製程之濺射技術”,復漢出版社,1997

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