本研究乃針對一製備奈/微米噴嘴薄膜的方法-犧牲式模版轉印技術
(Sacrificial template imprinting,STI)進行改良並對製程做進一步的探討。在STI 製程中，首先以乾蝕刻方法製備微針陣列，再以PDMS 和PVA 進行二次性轉印得到PVA 的微針陣列，最後利用旋轉塗佈製作出奈/微米噴嘴薄膜。薄膜製備的參數包含了微針的製作、形狀、間距、表面粗糙，及高分子溶液濃度、旋轉塗佈的步驟等。由實驗結果得知，高分子溶液在中低濃度下(10%~20%)旋轉塗佈所得的膜厚會較旋轉塗佈平板為薄，而在高濃度下(30%)會較平板為厚。旋轉塗佈在平板時，膜厚與濃度的2.49 次方成正比，與轉速的-0.5 次方成反比；當旋轉塗佈在有微結構的平板上時，則只有在中低濃度下(10~20%)會具有上述之關係。在高分子濃度10~20%的情形下，旋轉塗佈在不同間距的微結構，可發現當柱體間距愈小所得的膜厚也愈小，而且愈容易出現高分子在柱體間接連的現象。旋轉塗佈在不同粗糙度的圓柱微構，
在中低濃度的情形下，粗糙度會使得膜厚變得較大；但在高濃度下，則對膜厚的影響不大。本實驗製得的薄膜孔徑在1~4μm 之間，膜厚為5μm 左右。

In this study, we have conducted a series of experiments to investigate the sacrificial template imprinting (STI) method which is used to fabricate nano/micronozzle membrane. For STI process, the microneedle array with tips at nanoscale is produced by dry etching process, followed by mold transferring twice and spin coating polymer solution to obtain the nano/micronozzle membrane. The process include shape, spacing, surface roughness of microneedles, concentrations of polymer solution, and the rotation speed of spin coating. The results showed that, between 10~20% concentration, the thickness of the polymer membrane obtained by spin coating on substrate with microstructures is smaller than that obtained on plain substrate; however, it becomes
larger when concentration is high(30%). In addition, the relationship between membrane thickness, and spin speed and polymer concentration follows hf~C02.49Ω-0.5 at polymer
concentrations between 10~20%. Moreover, thicker membranes can be obtained by creating rough surface on the microstructures and small spacing between micropillars. It
was observed that polymer tends to bridge between micropillars when spacing between them becomes smaller. Finally, the polymeric nano/micronozzle membranes were
fabricated with the diameter at the small end around 1~4μm and membrane thickness 5μm.

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