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研究生: 施翰昆
Shih, Han-Kun
論文名稱: 無光罩曝光機之紫外光光源開發與成像鏡頭檢測
Ultraviolet Light Source Development and Imaging Lens Inspection for Maskless Lithography
指導教授: 李永春
Lee, Yung-Chun
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2022
畢業學年度: 110
語文別: 中文
論文頁數: 66
中文關鍵詞: 無光罩微影均光光源成像式複眼陣列鏡頭檢測調製傳遞函數
外文關鍵詞: Maskless Lithography, Homogenized Light Source, Imaging Lens, Modulation Transfer Function (MTF)
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  • 黃光微影製程技術是新興科技產業的重要核心技術,而無光罩微影技術則是黃光微影的最新發展趨勢。本論文針對以數位光學為基礎之無光罩微影系統中的二項重要元件進行研究,第一是設計可應用於無光罩微影系統之紫外光均光光源,第二是針對無光罩微影系統中成像鏡頭的性能進行檢測。
    在紫外光均光光源的開發方面,目標是要能夠均勻地照亮無光罩微影系統的核心元件:數位微反射鏡裝置 (Digital Micromirror Device, DMD),本研究將針對二種波長 (365 nm與405 nm) 之紫外光發光二極體作為光源,以成像式複眼透鏡陣列作為架構,分別完成均光面積14.1 × 7.7 mm2、14.4 × 7.8 mm2的紫外光均光光源,可以搭配DMD與成像鏡頭完成無光罩微影製程。
    在成像鏡頭檢測方面,引入調製傳遞函數 (Modulation Transfer Function, MTF) 的量測方法,透過CMOS影像感測器擷取經成像鏡頭投射成像之DMD產生的數位光學影像,藉由分析其分辨率與對比度,以實驗量測確認該成像鏡頭的MTF曲線與能量利用率。針對先前開發之0.5倍雙遠心紫外光鏡頭,實驗結果顯示在365 nm與405 nm的二種波長下,此一光學鏡頭均可以應用於以DMD為基礎的無光罩微影技術。

    關鍵字: 無光罩微影、均光光源、成像式複眼陣列、鏡頭檢測、調製傳遞函數

    Photolithography plays a critical role in many advanced technologies and industries. Maskless lithography has been emerging as a key technology in photolithography in recent years. In this thesis, two important components in maskless lithography systems based on digital light processing will be studied and investigated. The first one is to develop a homogenized ultraviolet (UV) light source for maskless lithography. The second one is to evaluate the optical performance of the imaging projection lens used in maskless lithography systems.
    In developing the homogenized UV light sources, UV light-emitting diodes are used along with the imaging type of fly-eye’s lens array homogenizer. Both light sources with the wavelength of 365 nm and 405 nm are successfully constructed for a uniformly lighted area of 14.1×7.7 mm2 and 14.4×7.8 mm2, which can be directly applied to DMD-based maskless lithography.
    In the optical evaluation of the UV imaging lens for maskless lithography, the concept of the modulation transfer function (MTF) is introduced. The optical image projected by a UV imaging lens and a DMD is captured and analyzed by a CMOS image sensor. The MTF curve of the UV imaging lens is found by analyzing the resolution and contrast. It is found experimentally that, for both wavelengths of 405 nm and 365 nm, the MTF and the transmission efficiency of the UV imaging lens are well enough for maskless lithography.
    Keywords: Maskless Lithography, Homogenized Light Source, Imaging Lens, lens Inspection, Modulation Transfer Function (MTF)

    摘要 II ABSTRACT III 致謝 XIII 目錄 XIV 表目錄 XV 圖目錄 XVII 第1章 緒論 1 1.1 研究動機 1 1.2 文獻回顧 2 1.2.1 無光罩微影技術(Maskless Lithography) 2 1.2.2 均光器與複眼透鏡陣列製造 4 1.2.3 鏡頭檢測 6 1.3 論文綱要 7 第2章 無光罩微影系統架構 8 2.1 光學投影系統架構 8 2.1.1 紫外光發光二極體光源 9 2.1.2 數位微反射鏡裝置 11 2.1.3 雙遠心成像鏡頭 14 2.2 運動控制系統 16 第3章 均光光源設計 18 3.1 均光光源設計 18 3.1.1 成像式複眼透鏡陣列 18 3.1.2 光源設計參數與材料選用 20 3.1.3 光學模擬與透鏡陣列設計 24 3.2 複眼透鏡製作與組裝[21] 29 3.2.1 複眼透鏡模具量測 30 3.2.2 陣列翻模製作 33 3.2.3 複眼透鏡量測 34 3.3 光源系統成品與實驗結果 37 3.3.1 LED 光源控制板與成品 37 3.3.2 能量量測與結果 39 第4章 鏡頭檢測 46 4.1 檢測理論基礎 46 4.1.1 分辨率 47 4.1.2 對比度 48 4.2 使用玻璃光罩進行鏡頭檢測 50 4.2.1 鏡頭檢測之玻璃光罩架構 50 4.2.2 在玻璃光罩架構下的MTF 51 4.3 使用數位微反射鏡裝置 (DMD) 進行鏡頭檢測 57 4.4 能量利用率 59 4.5 鏡頭檢測結果 61 第5章 結論與未來展望 62 5.1 結論 62 5.2 未來展望 63 參考文獻 64

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