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研究生: 紀秉夆
Chi, Ping-Feng
論文名稱: 透過冷壁式化學氣相沉積法成長不同晶體相位的MoTe2以改善二維材料與金屬之間的接觸電阻
Improving Contact Resistance between Two-Dimensional Materials and Metals through Cold-Wall Chemical Vapor Deposition-Grown MoTe2 with Varied Crystal Phases
指導教授: 許進恭
Sheu, Jinn-Kong
學位類別: 博士
Doctor
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2024
畢業學年度: 112
語文別: 英文
論文頁數: 197
中文關鍵詞: 二維材料二硫化鉬二碲化鉬化學氣相沉積法
外文關鍵詞: Two-dimensional materials, MoS2, MoTe2, Chemical Vapor Deposition (CVD)
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  • 本研究回顧了自2004發現石墨烯後的關鍵發展,石墨烯研究起始於一個偶然的發現,當時科學家們利用普通的膠帶從單晶石墨塊中剝離出石墨烯,這個方法看似簡單,卻革命性地取代了以往切割石墨塊技術,從而將石墨烯的獨特性質獻給了世界。2010年,石墨烯的發現因其特殊的物理及化學性質被授予諾貝爾物理學獎,成為首批受到廣泛矚目的二維材料,也因此其他科學家們更致力於探索石墨烯以外的材料,特別是不同能隙的二維材料,以期望追求更多的可能性。隨著人工智能技術的發展,對高速計算晶片的需求激增,使得晶片微縮技術成為全球半導體行業眾所矚目的焦點。業界各大廠商正集中力量解決隨著電晶體尺寸縮小而出現的短通道效應問題,這包括了漏電流的增加、閘極控制力的減弱以及次臨界擺幅的上升。各界學者發現,二維材料因其材料特性,應用在電晶體以減小通道長度、降低短通道效應方面展現出獨特優勢,同時高遷移率也使得電子和電洞能在通道中更快速移動,降低了電阻,從而提高了元件的開關速度。因此,在電子元件領域,二維材料展現出卓越的潛力。另一方面,目前電動車和自動駕駛系統的安全技術蓬勃發展,本文也探討了二維材料在光電元件上的應用潛力。鑑於石墨烯較難穩定控制能隙,因此引進了過渡金屬硫化物(TMDs)作為二維半導體,以期待提升光電元件的表現。最終,本研究介紹了一種磊晶生長技術,能夠製備出大面積、以及垂直堆疊的二維半導體及二維半金屬薄膜,並與傳統半導體製程相互結合,以推動二維材料在實際製品中的應用,開拓更多的使用可能性。

    This work examines the major advances in graphene since its discovery by A. Geim and K. Novoselov in 2004. The recovery originated by accident when the scientists fortuitously uncovered that single-crystal graphene could be easily peeled off using adhesive tape as an alternative to traditional cutting methods. This method introduced the unique properties of graphene to the scientific community. Honored with the Nobel Prize in Physics in 2010, the discovery of graphene became the first two-dimensional material to receive widespread attention, demonstrating unprecedented physical and chemical properties, as well as gradually integrating into the daily lives of human beings. With the rise of artificial intelligence, the demand for high-speed computing chips has driven chip miniaturization technology to the forefront of global semiconductor focus. Short-channel effects caused by electronic component miniaturization, such as MOSFET, include increased leakage current, decreased gate control capability, and increased subthreshold swing. With their slim profiles, two-dimensional materials effectively reduce channel length, mitigate short-channel effects, and enhance device performance. Additionally, the high carrier mobility of two-dimensional materials enables faster carrier movement, reducing transmission resistance and improving device switching speed. Combining these advantages, two-dimensional materials demonstrate superior performance in electronic component. This work further explores the application of two-dimensional materials in optical electronics, targeting the safety requirements in electric vehicles and automated driving systems. Considering the lack of energy bandgap in graphene, transition metal dichalcogenides (TMDs) are introduced as two-dimensional semiconductors to enhance optical electronics performance. Finally, this thesis proposes an epitaxial growth method to generate large-area, few-layer device-grade films with conventional semiconductor processes to push the application of two-dimensional materials from the laboratory to practical production, with the expectation of opening up more possibilities.

    摘要 i Abstract ii 致謝 iii Contents iv Table Captions viii Figure Captions ix Chapter 1 1 Introduction 1 1-1 Background 1 1-1-1 Nanotechnology and the Proliferation of Electric Vehicles 1 1-1-2 The Industrial Revolution and Material Science 3 1-1-3 What Are Two-Dimensional Materials? 5 1-2 Overview of Transition-Metal Dichalcogenides: MoS2 and MoTe2 7 1-2-1 Crystal Structure and Optoelectronic Properties of MoS2 7 1-2-2 Crystal Structure and Optoelectronic Properties of MoTe2 8 1-3 Motivation 10 1-4 Current Research Status and Bottlenecks of 2D Materials at home and abroad 15 1-5 Methods of Preparing Two-Dimensional Materials in This Laboratory 21 1-5-1 Mechanical Exfoliation to Obtain Two-Dimensional Materials 21 1-5-2 Large-Area Two-Dimensional Materials Synthesis via Hot-Wall Chemical Vapor Deposition (HW-CVD) Process 23 Chapter 2 28 Experimental 28 2-1 Setup of Facility 28 2-2 Setup of CW-CVD equipment 29 2-3 Sapphire & SiO2/Si Substrate Preparation 32 2-4 Measurement Theory 34 2-4-1 Raman Spectroscopy 34 2-4-2 FIB (Focused Ion Beam) 36 2-4-3 TEM (Transmission electron microscope) 37 2-4-4 Transfer Length Method (TLM) 39 Chapter 3 41 Large-area MoS2 grown by CW-CVD on 2-inch substrates 41 3-1 Introduction 41 3-2 MoS2 Thin Film Preparation Process 42 3-2-1 Sample Preparation and Equipment Pre-setup 42 3-2-2 MoS2 Epitaxial Growth Process 43 3-3 Result and discussion 44 3-3-1 Growth of MoS2 under Different Chamber Pressures 44 3-3-2 Growth of MoS2 Films at Different Susceptor Temperatures 47 3-3-3 Growth of MoS2 Films on Different Substrates 50 3-3-4 Surface Uniformity of MoS2 Films Grown on Sapphire Substrates 51 3-4 Summary 52 Chapter 4 53 Pure-Phase 1T'-MoTe2 and 2H-MoTe2 growth by Cold-Wall CVD 53 4-1 Introduction 53 4-2 MoTe2 Film Preparation Process 54 4-2-1 Sample Preparation and Equipment Setup 54 4-2-2 1T'-MoTe2 Epitaxial Growth Process 55 4-2-3 2H-MoTe2 Epitaxial Growth Process 56 4-3 Result and discussion 58 4-3-1 Raman Spectroscopy of MoTe2 Films Converted from MoOx at Different Tellurization Temperatures 58 4-3-2 Adjusting Chamber Pressure During MoOx Growth to Improve the Surface Uniformity of MoTe2. 61 4-3-3 The Impact of Opening the Chamber at Different Temperatures on MoTe2 62 4-3-4 Raman Spectra of MoOx Grown at Different Temperatures and Tellurized into MoTe2 67 4-3-5 Raman spectra of MoTe2 following tellurization of MoOx grown under high to low chamber pressures 70 4-3-6 Raman Spectra of MoTe2 Formed via Tellurization of High Growth Rate (H.G.R) and Low Growth Rate (L.G.R) MoOx. 72 4-3-7 Raman Spectroscopic Analysis of MoTe2 Formation from MoOx with H2 Treatment 74 4-3-8 Simultaneous Growth of 2H-MoTe2 on Sapphire and SiO2/Si Substrates 75 4-3-9 Summary 77 Chapter 5 78 5-1 Introduction 78 5-2 Relationship between Substrate Surface Roughness and 2D-Materials 81 5-2-1 Imaging the Cross-Sectional Growth of 2H-MoTe2 and 1T’-MoTe2 Films on SiO2/Si Substrate 81 5-2-2 Imaging the Cross-Sectional Growth of 2H-MoTe2 and 1T’-MoTe2 Films on Sapphire Substrate 86 5-2-3 Growth of 2H-MoTe2 on ALD Al2O3/Si Substrate 91 5-3 Growth Mechanism of 2D-Material 2H-MoTe2 on Sapphire Substrate 95 5-4 Analysis of the Optoelectronic Properties of 2H-MoTe2 with Different Layer Numbers Grown on a Sapphire Substrate 101 5-4-1 Analysis of 2H-MoTe2 Growth with Different Layer Numbers on Sapphire Substrate Using AFM Measurements 101 5-4-2 Raman Spectra Analysis of 2H-MoTe2 with Different Layer Numbers Grown on a Sapphire Substrate 102 5-4-3 2D X-ray Diffractometer Analysis of 2H-MoTe2 with Different Layer Numbers Grown on a Sapphire Substrate 104 5-4-4 Photoluminescence (PL) Analysis of 2H-MoTe2 with different Layer Numbers Grown on Sapphire Substrate 108 5-4-5 Hall Effect Analysis of 2H-MoTe2 Thin Films Grown on Sapphire Substrates 110 5-5 Analysis of the Optoelectronic Properties of 1T'-MoTe2 with Different Layer Numbers Grown on a Sapphire Substrate. 112 5-5-1 AFM Measurement Analysis of 1T’-MoTe2 with Different Layer Numbers Grown on Sapphire. 112 5-5-2 Raman Measurement Analysis of 1T’-MoTe2 with Different Layer Numbers Grown on Sapphire. 113 5-5-3 XRD Analysis of 1T’-MoTe2 with Different Layer Numbers Grown on Sapphire 114 5-5-4 Hall Effect Analysis of 1T’-MoTe2 Thin Films Grown on Sapphire Substrates 116 5-5-5 Raman Spectra Analysis of 1T’-MoTe2 at Different Tellurization Temperatures 122 5-5-6 Fabrication of Transfer Length Model (TLM) for Characterizing Contact Resistance of 1T’-MoTe2 Synthesized with Different Tellurization Temperatures 124 5-6 Analysis of the Optoelectronic Properties of Layered and Non-layered Stacked 1T’-MoTe2 126 5-6-1 TEM Analysis of Layered and Non-layered Stacking in 1T’-MoTe2 126 5-6-2 Raman Analysis of Layered and Non-layered Stacking in 1T’-MoTe2 127 5-6-3 2D X-ray Analysis of Layered and Non-layered Stacking in 1T’-MoTe2 128 5-7 Analysis of the Key in Phase Transition of MoTe2 through XPS Measurements 130 5-8 Vertically Stacked Heterostructures of 2H/1T’-MoTe2 135 5-8-1 Growth Method for 2H/1T’-MoTe2 Vertically Stacked Heterostructures 135 5-8-2 Raman Spectroscopy and HR-TEM Analysis of 2H/1T’-MoTe2 Vertically Stacked Heterostructures 137 5-8-3 Raman Spectra Analysis of 2H/1T’-MoTe2 Structure with Etching Process 139 5-8-4 Band Structure Analysis of 2H-MoTe2 and 1T’-MoTe2 via Ultraviolet Photoelectron Spectroscopy (U.P.S) and Low Energy Inverse Photoelectron Spectroscopy (LEIPS) 141 5-9 Strategies to Address Schottky Contact Induced by Metal Vertical Contact with 2H-MoTe2 143 5-9-1 Process Steps for Fabricating Transfer Length Method (TLM) on 2H/1T’-MoTe2 143 5-9-2 Contact Resistance between 2H-MoTe2 and 2H/1T’-MoTe2 Heterostructures and Metals 146 5-10 Carrier-Type Modulation of MoTe2 149 5-10-1 Formation Mechanisms of n-MoTe2 and p-MoTe2 149 5-10-2 Preparation of n-MoTe2 and p-MoTe2 151 5-10-3 Formation of Ohmic or Schottky Contacts with p-MoTe2 and Different Metals 154 5-11 Growth of Large-Area MoTe2 Thin Films on 2-Inch and 4-Inch Substrates 159 5-12 Summary 161 Chapter 6 163 Applications of MoTe2 in Gas Sensor and MESFET Devices 163 6-1 Introduction 163 6-2 The Application of MoTe2 in Gas Sensors 164 6-3 The Application of MoTe2 in MESFET (Metal Semiconductor Field Effect Transistor) 167 Chapter 7 169 Conclusions and Future work 169 7-1 Conclusions 169 7-2 Future work 172 Reference 173 Publication list 179

    [1] 簡永昌. "電動自駕車年複合成長率18.3%,這2項需求跟著大爆炸!晶圓代工業還能多熱?." https://www.bnext.com.tw/article/61503/electric-vehicle-foundry-tsmc-umc-? (accessed.
    [2] M. v. d. Brink. https://www.asml.com/en/investors/investor-days/2018 (accessed.
    [3] K. S. Novoselov et al., "Electric field effect in atomically thin carbon films," science, vol. 306, no. 5696, pp. 666-669, 2004.
    [4] C. Lee, X. Wei, J. W. Kysar, and J. Hone, "Measurement of the elastic properties and intrinsic strength of monolayer graphene," science, vol. 321, no. 5887, pp. 385-388, 2008.
    [5] R. R. Nair et al., "Fine structure constant defines visual transparency of graphene," science, vol. 320, no. 5881, pp. 1308-1308, 2008.
    [6] S. Ghosh et al., "Extremely high thermal conductivity of graphene: Prospects for thermal management applications in nanoelectronic circuits," Applied Physics Letters, vol. 92, no. 15, 2008.
    [7] S.-J. Huang, K. Park, and Y.-T. Hsu, "Hybrid-order topological superconductivity in a topological metal 1T’-MoTe2," npj Quantum Materials, vol. 9, no. 1, p. 21, 2024.
    [8] M. Pitkänen, "What happens in the transition to superconductivity?," 2024.
    [9] Y. Gong et al., "Direct chemical conversion of graphene to boron-and nitrogen-and carbon-containing atomic layers," Nature communications, vol. 5, no. 1, p. 3193, 2014.
    [10] K. F. Mak, C. Lee, J. Hone, J. Shan, and T. F. Heinz, "Atomically thin MoS2: a new direct-gap semiconductor," Physical review letters, vol. 105, no. 13, p. 136805, 2010.
    [11] H. Liu, S. L. Wong, and D. Chi, "CVD growth of MoS2‐based two‐dimensional materials," Chemical Vapor Deposition, vol. 21, no. 10-11-12, pp. 241-259, 2015.
    [12] T. A. Empante et al., "Chemical vapor deposition growth of few-layer MoTe2 in the 2H, 1T′, and 1T phases: tunable properties of MoTe2 films," ACS nano, vol. 11, no. 1, pp. 900-905, 2017.
    [13] D. H. Keum et al., "Bandgap opening in few-layered monoclinic MoTe2," Nature Physics, vol. 11, no. 6, pp. 482-486, 2015.
    [14] J. C. Park, E. Jung, S. Lee, J. Hwang, and Y. H. Lee, "Evidence of shallow band gap in ultrathin 1T'-MoTe2 via infrared spectroscopy," Physical Review B, vol. 101, no. 23, p. 235434, 2020.
    [15] R. Qi et al., "Influence of plasma-induced phase transition on contact resistance in MoTe2 with varying thickness," Materials Science in Semiconductor Processing, vol. 169, p. 107889, 2024.
    [16] I. G. Lezama et al., "Indirect-to-direct band gap crossover in few-layer MoTe2," Nano letters, vol. 15, no. 4, pp. 2336-2342, 2015.
    [17] D. Qu et al., "Carrier‐type modulation and mobility improvement of thin MoTe2," Advanced Materials, vol. 29, no. 39, p. 1606433, 2017.
    [18] Y. J. Park, A. K. Katiyar, A. T. Hoang, and J. H. Ahn, "Controllable p‐and n‐type conversion of MoTe2 via oxide interfacial layer for logic circuits," Small, vol. 15, no. 28, p. 1901772, 2019.
    [19] S. Aftab, M. F. Khan, P. Gautam, H. Noh, and J. Eom, "MoTe2 van der Waals homojunction p–n diode with low resistance metal contacts," Nanoscale, vol. 11, no. 19, pp. 9518-9525, 2019.
    [20] R. Sankar et al., "Polymorphic layered MoTe2 from semiconductor, topological insulator, to Weyl semimetal," Chemistry of Materials, vol. 29, no. 2, pp. 699-707, 2017.
    [21] C. Kim et al., "Fermi level pinning at electrical metal contacts of monolayer molybdenum dichalcogenides," ACS nano, vol. 11, no. 2, pp. 1588-1596, 2017.
    [22] K. Sotthewes et al., "Universal Fermi-level pinning in transition-metal dichalcogenides," The Journal of Physical Chemistry C, vol. 123, no. 9, pp. 5411-5420, 2019.
    [23] A. Allain, J. Kang, K. Banerjee, and A. Kis, "Electrical contacts to two-dimensional semiconductors," Nature materials, vol. 14, no. 12, pp. 1195-1205, 2015.
    [24] P.-C. Shen et al., "Ultralow contact resistance between semimetal and monolayer semiconductors," Nature, vol. 593, no. 7858, pp. 211-217, 2021.
    [25] Y. Liu, P. Stradins, and S.-H. Wei, "Van der Waals metal-semiconductor junction: Weak Fermi level pinning enables effective tuning of Schottky barrier," Science advances, vol. 2, no. 4, p. e1600069, 2016.
    [26] J. Bernède, C. Amory, L. Assmann, and M. Spiesser, "X-ray photoelectron spectroscopy study of MoTe2 single crystals and thin films," Applied surface science, vol. 219, no. 3-4, pp. 238-248, 2003.
    [27] S. Vishwanath et al., "MBE growth of 2H-MoTe2 and 1T'-MoTe2 on 3D substrates," arXiv preprint arXiv:1705.00651, 2017.
    [28] H. Li, J. Wu, Z. Yin, and H. Zhang, "Preparation and applications of mechanically exfoliated single-layer and multilayer MoS2 and WSe2 nanosheets," Accounts of chemical research, vol. 47, no. 4, pp. 1067-1075, 2014.
    [29] H. Xu, S. Fathipour, E. W. Kinder, A. C. Seabaugh, and S. K. Fullerton-Shirey, "Reconfigurable ion gating of 2H-MoTe2 field-effect transistors using poly (ethylene oxide)-CsClO4 solid polymer electrolyte," ACS nano, vol. 9, no. 5, pp. 4900-4910, 2015.
    [30] H. Li, Y. Li, A. Aljarb, Y. Shi, and L.-J. Li, "Epitaxial growth of two-dimensional layered transition-metal dichalcogenides: growth mechanism, controllability, and scalability," Chemical reviews, vol. 118, no. 13, pp. 6134-6150, 2017.
    [31] S. Pace et al., "Synthesis of large-scale monolayer 1T'-MoTe2 and its stabilization via scalable hBN encapsulation," ACS nano, vol. 15, no. 3, pp. 4213-4225, 2021.
    [32] B. Chen et al., "Environmental changes in MoTe2 excitonic dynamics by defects-activated molecular interaction," Acs Nano, vol. 9, no. 5, pp. 5326-5332, 2015.
    [33] N. Horiguchi. "Entering the nanosheet transistor era." https://www.imec-int.com/en/articles/entering-nanosheet-transistor-era-0 (accessed.
    [34] B. Radisavljevic, A. Radenovic, J. Brivio, V. Giacometti, and A. Kis, "Single-layer MoS2 transistors," Nature nanotechnology, vol. 6, no. 3, pp. 147-150, 2011.
    [35] J. Hone, "Transport measurements of MoS2 using a van der Waals heterostructure device platform," Bulletin of the American Physical Society, vol. 61, 2016.
    [36] L. Xie et al., "Graphene‐contacted ultrashort channel monolayer MoS2 transistors," Advanced Materials, vol. 29, no. 37, p. 1702522, 2017.
    [37] Y. Liu et al., "Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions," Nature, vol. 557, no. 7707, pp. 696-700, 2018.
    [38] Y. Wang et al., "Van der Waals contacts between three-dimensional metals and two-dimensional semiconductors," Nature, vol. 568, no. 7750, pp. 70-74, 2019.
    [39] G. Bae et al., "3nm GAA technology featuring multi-bridge-channel FET for low power and high performance applications," in 2018 IEEE International Electron Devices Meeting (IEDM), 2018: IEEE, pp. 28.7. 1-28.7. 4.
    [40] G. Arutchelvan et al., "Impact of device scaling on the electrical properties of MoS2 field-effect transistors," Scientific reports, vol. 11, no. 1, p. 6610, 2021.
    [41] X. Xiong et al., "Demonstration of Vertically-stacked CVD Monolayer Channels: MoS 2 Nanosheets GAA-FET with I on> 700 µA/µm and MoS2/WSe2 CFET," in 2021 IEEE International Electron Devices Meeting (IEDM), 2021: IEEE, pp. 7.5. 1-7.5. 4.
    [42] X. Ling, H. Wang, S. Huang, F. Xia, and M. S. Dresselhaus, "The renaissance of black phosphorus," Proceedings of the National Academy of Sciences, vol. 112, no. 15, pp. 4523-4530, 2015.
    [43] S.-K. Su, C.-P. Chuu, M.-Y. Li, C.-C. Cheng, H.-S. P. Wong, and L.-J. Li, "Layered semiconducting 2D materials for future transistor applications," Small Structures, vol. 2, no. 5, p. 2000103, 2021.
    [44] S. Manzeli, D. Ovchinnikov, D. Pasquier, O. V. Yazyev, and A. Kis, "2D transition metal dichalcogenides," Nature Reviews Materials, vol. 2, no. 8, pp. 1-15, 2017.
    [45] N. Ma and D. Jena, "Charge scattering and mobility in atomically thin semiconductors," Physical Review X, vol. 4, no. 1, p. 011043, 2014.
    [46] X. Cui et al., "Multi-terminal transport measurements of MoS2 using a van der Waals heterostructure device platform," Nature nanotechnology, vol. 10, no. 6, pp. 534-540, 2015.
    [47] Y. Liu, X. Duan, H.-J. Shin, S. Park, Y. Huang, and X. Duan, "Promises and prospects of two-dimensional transistors," Nature, vol. 591, no. 7848, pp. 43-53, 2021.
    [48] K. P. O'Brien et al., "Advancing 2D monolayer CMOS through contact, channel and interface engineering," in 2021 IEEE International Electron Devices Meeting (IEDM), 2021: IEEE, pp. 7.1. 1-7.1. 4.
    [49] X. Li et al., "Large-area synthesis of high-quality and uniform graphene films on copper foils," science, vol. 324, no. 5932, pp. 1312-1314, 2009.
    [50] S. Bae et al., "Roll-to-roll production of 30-inch graphene films for transparent electrodes," Nature nanotechnology, vol. 5, no. 8, pp. 574-578, 2010.
    [51] T. Kobayashi et al., "Production of a 100-m-long high-quality graphene transparent conductive film by roll-to-roll chemical vapor deposition and transfer process," Applied Physics Letters, vol. 102, no. 2, 2013.
    [52] S. E. Panasci et al., "Multiscale investigation of the structural, electrical and photoluminescence properties of MoS2 obtained by MoO3 sulfurization," Nanomaterials, vol. 12, no. 2, p. 182, 2022.
    [53] X. Zhang et al., "Low contact barrier in 2H/1T'-MoTe2 in-plane heterostructure synthesized by chemical vapor deposition," ACS applied materials & interfaces, vol. 11, no. 13, pp. 12777-12785, 2019.
    [54] J. Li, S. Cheng, Z. Liu, W. Zhang, and H. Chang, "Centimeter-scale, large-area, few-layer 1T'-WTe2 films by chemical vapor deposition and its long-term stability in ambient condition," The Journal of Physical Chemistry C, vol. 122, no. 12, pp. 7005-7012, 2018.
    [55] G. Siegel, Y. Venkata Subbaiah, M. C. Prestgard, and A. Tiwari, "Growth of centimeter-scale atomically thin MoS2 films by pulsed laser deposition," APL materials, vol. 3, no. 5, 2015.
    [56] H. Yu et al., "Wafer-scale growth and transfer of highly-oriented monolayer MoS2 continuous films," ACS nano, vol. 11, no. 12, pp. 12001-12007, 2017.
    [57] H. C. Diaz, R. Chaghi, Y. Ma, and M. Batzill, "Molecular beam epitaxy of the van der Waals heterostructure MoTe2 on MoS2: phase, thermal, and chemical stability," 2D Materials, vol. 2, no. 4, p. 044010, 2015.
    [58] L. Sun et al., "Phase-controlled large-area growth of MoTe2 and MoTe2-xOx/MoTe2 heterostructures for tunable memristive behavior," Applied Surface Science, vol. 496, p. 143687, 2019.
    [59] D. Wu et al., "Phase-controlled van der Waals growth of wafer-scale 2D MoTe2 layers for integrated high-sensitivity broadband infrared photodetection," Light: Science & Applications, vol. 12, no. 1, p. 5, 2023.
    [60] R. Datta et al., "Highly active two dimensional α-MoO3−x for the electrocatalytic hydrogen evolution reaction," Journal of Materials Chemistry A, vol. 5, no. 46, pp. 24223-24231, 2017.
    [61] S. Jo, Y.-W. Lee, J. Hong, and J. I. Sohn, "Simple and facile fabrication of anion-vacancy-induced MoO3−x catalysts for enhanced hydrogen evolution activity," Catalysts, vol. 10, no. 10, p. 1180, 2020.
    [62] M. Dieterle and G. Mestl, "Raman spectroscopy of molybdenum oxides Part II. Resonance Raman spectroscopic characterization of the molybdenum oxides Mo4 O11 and MoO2," Physical Chemistry Chemical Physics, vol. 4, no. 5, pp. 822-826, 2002.
    [63] J. P. Fraser et al., "Selective phase growth and precise-layer control in MoTe2," Communications Materials, vol. 1, no. 1, p. 48, 2020.
    [64] M. Camacho-López, L. Escobar-Alarcón, M. Picquart, R. Arroyo, G. Córdoba, and E. Haro-Poniatowski, "Micro-Raman study of the m-MoO2 to α-MoO3 transformation induced by cw-laser irradiation," Optical Materials, vol. 33, no. 3, pp. 480-484, 2011.
    [65] Y.-M. Chang, C.-Y. Lin, Y.-F. Lin, and K. Tsukagoshi, "Two-dimensional MoTe2 materials: From synthesis, identification, and charge transport to electronics applications," Japanese journal of applied physics, vol. 55, no. 11, p. 1102A1, 2016.
    [66] J.-H. Li et al., "Thickness-dependent excitonic properties of atomically thin 2H-MoTe2," Chinese Physics B, vol. 29, no. 1, p. 017802, 2020.
    [67] S. Cho et al., "Phase patterning for ohmic homojunction contact in MoTe2," Science, vol. 349, no. 6248, pp. 625-628, 2015.
    [68] L. Zhou et al., "Large-area synthesis of high-quality uniform few-layer MoTe2," Journal of the American Chemical Society, vol. 137, no. 37, pp. 11892-11895, 2015.
    [69] C. H. Naylor et al., "Monolayer single-crystal 1T′-MoTe2 grown by chemical vapor deposition exhibits weak antilocalization effect," Nano letters, vol. 16, no. 7, pp. 4297-4304, 2016.
    [70] Y. Yoo, Z. P. DeGregorio, Y. Su, S. J. Koester, and J. E. Johns, "In‐plane 2H‐1T'-MoTe2 homojunctions synthesized by flux‐controlled phase engineering," Advanced Materials, vol. 29, no. 16, p. 1605461, 2017.
    [71] S. Aftab et al., "Lateral PIN (p-MoTe2/Intrinsic-MoTe2/n-MoTe2) Homojunction Photodiodes," ACS Applied Nano Materials, vol. 5, no. 5, pp. 6455-6462, 2022.
    [72] C. Zhang et al., "Manipulating the Interfacial Band Bending For Enhancing the Thermoelectric Properties of 1T'-MoTe2/Bi2Te3 Superlattice Films," Small, p. 2300745, 2023.
    [73] S. Yang et al., "Large-Scale Vertical 1T'-/2H MoTe2 Nanosheet-Based Heterostructures for Low Contact Resistance Transistors," ACS Applied Nano Materials, vol. 3, no. 10, pp. 10411-10417, 2020.
    [74] S. Song et al., "Fabrication of p-type 2D single-crystalline transistor arrays with Fermi-level-tuned van der Waals semimetal electrodes," Nature Communications, vol. 14, no. 1, p. 4747, 2023.
    [75] D. M. Kim, S.-i. Kim, and T. Kim, "Accurate Analysis of Schottky Barrier Height in Au/2H–MoTe2 Atomically Thin Film Contact," Electronic Materials Letters, vol. 17, pp. 307-314, 2021.
    [76] J. H. Sung et al., "Coplanar semiconductor–metal circuitry defined on few-layer MoTe2 via polymorphic heteroepitaxy," Nature nanotechnology, vol. 12, no. 11, pp. 1064-1070, 2017.
    [77] D. Choi et al., "Directly grown Te nanowire electrodes and soft plasma etching for high-performance MoTe2 field-effect transistors," Applied Surface Science, vol. 565, p. 150521, 2021.
    [78] R. S. Lee, D. Kim, S. A. Pawar, T. Kim, J. C. Shin, and S.-W. Kang, "van der Waals epitaxy of high-mobility polymorphic structure of Mo6Te6 nanoplates/MoTe2 atomic layers with low Schottky barrier height," ACS nano, vol. 13, no. 1, pp. 642-648, 2019.
    [79] K. G. Krishna, G. Umadevi, S. Parne, and N. Pothukanuri, "Zinc oxide based gas sensors and their derivatives: a critical review," Journal of Materials Chemistry C, vol. 11, no. 12, pp. 3906-3925, 2023.
    [80] S.-Y. Chu, M.-J. Wu, T.-H. Yeh, C.-T. Lee, and H.-Y. Lee, "Sensing Mechanism and Characterization of NO2 Gas Sensors Using Gold-Black NP-Decorated Ga2O3 Nanorod Sensing Membranes," ACS sensors, vol. 9, no. 1, pp. 118-125, 2023.

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