本研究利用直流磁控濺鍍方式，於室溫下沉積Zn1-xCoxO之光觸媒薄膜，並將沉積後的薄膜進行熱擴散處理，改質薄膜之能隙。薄膜之物性研究方面，由低掠角X光繞射儀與掃描式電子顯微鏡分析，探討薄膜於不同製程條件之微結構與表面形貌，並利用X光光電子能譜儀分析薄膜表面之化學組態。在光學分析方面，則是利用紫外光-可見光分光儀量測光觸媒薄膜之能隙。
由實驗結果顯示，在濺鍍過程中，可添加不同含量的氧氣氛，以填補氧空缺，改變氧空缺含量，使缺陷量達到一理想值(IVo/IO=0.13)，使其在有最佳之光觸媒效能。經由900℃熱擴散製程的光觸媒薄膜，其能隙不只下降至可見光範圍2.97 eV，整體光觸媒降解亞甲基藍效率也可提升為未經熱處理顯著3倍。造成能隙改質之原因是結合薄膜內晶粒由9.79 nm成長至24.79 nm及鈷元素含量由0.67 %增加至1.40%，使鈷的d軌域與ZnO的sp軌域進行混成，縮減能隙，同時藉此抑制電子電洞對再結合，提升光觸媒效能。而在抗菌測試中，經由熱擴散處理的光觸媒，也具有清楚的抑菌圈，可說明經由熱擴散處理的光觸媒於可見光下具有分解有機污染物及殺菌之功效。合上述之實驗，在濺鍍功率為80 W，濺鍍氣氛含30 % O2，熱擴散處理溫度900℃，薄膜之結晶度不僅僅有所成長，鈷含量也增加為未經熱處理薄膜2倍，而且光觸媒內的氧空缺最為適量，故在可見光條件下，擁有最顯著光觸媒效能。
在本實驗的製程，熱擴散的處理可明顯的在可見光照射下提升光觸媒對有機物質的降解能力與抗菌能力，以應用於室內潔淨，提升室內生活品質。

In this study, we deposited Zn1-xCoxO photocatalyst thin film under room temperature by magnetron DC sputtering deposition and post thermal diffusion process to modify its band gap. To characterize its physical properties, we utilized XRD and SEM to analyze the microstructure and morphology of the thin film. And we also utilized XPS to discuss surface chemical composition. To determine its optical property, we utilized UV/vis spectrometer to calculate the band gap of thin film.
Our research indicates that adding different oxygen ratio during sputtering process can supply oxygen vacancies to find out the optimal impurity content for the best photocatalytic effect. Photocatalyst thin film under 900℃ thermal diffusion process can only narrow its band gap to 2.97 eV which lies in visible light range but also enhance photocatalytic effect measured by methylene blue degradation. The reasons to modify the band gap are grain growth from 9.79 nm to 24.79 nm and cobalt atomic concentration increasement 0.67 % to 1.40 % to force the hybrid with d orbital of transition metal element and sp orbital of ZnO, meanwhile, inhibit electron-hole pair recombination to improve photocatalytic effect. As the results of anti-bacterial test, photocatalyst under post-thermal diffusion process revealed inhibition zone clearly which indicate that thin film through thermal diffusion can degrade organic pollutants and sterilize under visible light. Summarize the data we tested, while sputter power is 80 W, oxygen ratio keeps 30 % during sputter and diffusion temperature controls 900℃, the crystallinity will improve and cobalt concentration will be twice as much as unheated film, furthermore, the oxygen vacancy content is most optimal. Therefore, it possessed most predominant photocatalytic effect.
From our experiment, thermal diffusion process can improve photocatalytic organic degradation and anti-bacterial capability under visible light exposure. Therefore, it can apply for indoor cleaning to promote a high living quality.

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