本研究主要利用背後曝光顯影製程與二氧化碳雷射加工技術，探討其對高分子微結構製程形貌的控制及應用。文中第一個部分主要提出以背後曝光顯影製程，製作不同角度高分子圓錐柱微結構，並應用至LCD導光板，探討背後曝光與曝光劑量對結構角度形貌的變化及出光均齊度影響。第二個部分是以二氧化碳雷射加工微結構，提出以神經網路來預測雷射光刻微結構深度與尺寸的變化，應用在可撓式光纖導光板微結構的製作。藉由本文實驗方法與結果顯示，在第一部分以背後曝光調變曝光劑量從200~1200 mJ/cm2，可製作出70o~5o不同角度圓錐柱結構，與目前商用導光板測試比較，可得較好的出光均齊度；第二部分利用雷射加工可撓性導光板，提出以神經網路方法可精準的預測雷射在不同的參數條件下，光刻微結構深度變化，製作出達80%的高均齊出光亮度微結構面板。透過本文研究預期可應用在光電顯示器導光板高分子微結構製程，以及微機電材料與雷射加工製程的領域上。

The goal of this research is to develop the microstructure fabrication technology of polymer materials using back side exposure and CO2 laser machining. First, author fabricates the polymer microsture on light guide plate using back exposure method. The effect of exposure dose on luminance of light guide plate is also discussed. Second, the prediction of ablation depth of polymer optical fiber is performed by the neural network. The developed neural network can clearly construct the relationship between process parameters and machined depth. Therefore, laser ablation depth can be predicted using neural network. The variation between the predicted and measured depth is less to 10%. The developed technology can be applied to the field of the LCD display.

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