| 研究生: |
郭晉良 Kuo, Chin-Liang |
|---|---|
| 論文名稱: |
準分子雷射加工微型3D立體結構 Fabrication of 3D Micro Structure using Excimer Laser |
| 指導教授: |
李永春
Lee, Yung-Chun |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2002 |
| 畢業學年度: | 90 |
| 語文別: | 中文 |
| 論文頁數: | 135 |
| 中文關鍵詞: | 旋轉光罩法 、3D軸對稱微結構 、準分子雷射 |
| 外文關鍵詞: | Excimer Laser, 3D axially symmetrical micro-structures, mask rotation method |
| 相關次數: | 點閱:150 下載:5 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本論文利用準分子雷射微細加工技術製作微小的3D軸對稱微結構,主要研究重點是發展旋轉工件或旋轉光罩加工技術及其相關的特殊光罩設計方法,其目的是希望加工出剖面為任意曲線的3D軸對稱微小工件,以克服傳統微機電製程中僅限於2D結構的限制。本文將由實驗了解此旋轉加工法的能力與限制,包括加工面曲線的精確度、加工速度、加工面的粗糙度等等。
實驗中選擇三種高分子材料(PMMA、PC、PS)作為研究對象,並嘗試特徵加工尺寸約為數十微米(μm)到數百微米的微結構,結構的型態有凸出的錐狀體與內凹的碗狀體,及其各種變化的形狀;加工結果顯示,準分子雷射加工與光罩旋轉法的確可以控制所需要的各種加工曲面,加工精確度也相當良好,加工速度非常高;在粗糙度方面,PC與PS的材料較佳。實驗結果顯示,此加工方法可以配合LIGA的後段製程,因此非常有發展潛力。
另外,為克服原本準分子雷射加工機的限制,本文嘗試將雷射光導引至外部的光學桌上,並以光學鏡組重建加工光路,以進行本研究的各種實驗工作,同時,也利用商用光學分析軟體,分析準分子雷射的加工光路設計,因此可以掌握整個系統的設計與應用,有助於未來發展準分子雷射加工技術。
This study applies excimer laser micro-machining technology for manufacturing 3D axially symmetrical micro-structures. It is based on a work-piece rotation or mask rotation method in conjunction with the unique capabilities of an excimer laser micro-machining system. Specially designed laser masks have been developed for machining various kinds of 3D surface profiles. The goal is to understand the feasibility of this micro-machining method and its accuracy in producing a given profile of structure surface. Surface roughness and machining speed are also under evaluation.
The research is carried out on three different polymer materials, namely, PMMA, PC, and PS. Axially symmetrical micro-structures with concave and convex surfaces are manufactured by the mask rotation method. The surface profiles have been characterized and compared with their theoretical counterparts. Good agreement is observed. Furthermore, PC and PS have better surface roughness in comparison to PMMA. The machining time for each structure is limited to few minutes, which is very satisfactory.
In order to overcome several limitations on the excimer laser micro-machining system, this work also re-developed the optical system for the laser beam so that the machining can be carried out on an optical table. This greatly enhances the performance of the micro-machining system and its flexibility. A commercial optical analysis software (ZEMAX) has also been used for analyze the system. The work presented in this thesis can be very useful to future studies on excimer laser micro-machining and LIGA-like MEMS technology development.
[1]N. G. Basov, V. A. Danilychev, Y. M. Popov, and D. D. Khodkevich, “Laser operating in the vacuum region of the spectrum by excitation of liquid xenon with an electron beam,” J. of Experimental and Theoretical Physic Letters, Vol. 12, p.329 (1970).
[2]S. Searles, G. Hart, “Stimulated emission at 281.8nm from XeBr,” Applied Physics Letters, Vol. 27, p.243(1975).
[3]R. Schuster, “Practical Resolution Limit of KrF Lithography,” VLSI Technology, Systems, and Applications, International Symposium, p.123(1999).
[4]郭士豪, 李永春, “準分子雷射應用於加工軸對稱之立體微結構,” 第十六屆全國機械工程學術研討會論文集, 第五冊, p.45(1999).
[5]王述宜, 黃永翔, 陳建宇, 羅德亨, “準分子雷射三次元加工之研究,” 第十六屆全國機械工程學術研討會論文集, 第五冊, p.29(1999).
[6]A. Y. Popovic, “Technique for the monolithic fabrication of micro lens array,” Appl. Opt. Vol. 27, p.1281(1998).
[7]N. F. Borelli, “Photolytic technique for producing microlens in photosensitive glass,” Appl. Opt. Vol. 24, p.1281(1995).
[8]S. Sizinger and J. Jahns, Micro-optics, Wiely Inc, New York, USA(1999).
[9]D. L. Macfarlane, “Microjet fabrication of microlens array,” IEEE Photon. Technol. Letter, Vol. 6, p.1112(1994).
[10]王述宜, 陳建宇, 張榮森, 陳建人, “以灰階光罩製作非球面微透鏡陣列之研究,” 第十七屆全國機械工程學術研討會論文集, 第五冊, p.111(2000).
[11]http://www.immmainz.de/products/lens.htm14.
[12]A. Braun, K. Zimmer, B. Hosselbrath, J. Meinhardt, F. Bigl, R. Mehnert, “Excimer Laser Micromachining and replication of 3D optical surface,” Applied Surface Science, Proceedings of the 1997 4th International Conference on Laser Ablation, Vol. 127-129 p.315(1998).
[13]ZEMAX Optical Design Program, User’s Guide Version 10.0, Focus Software Inc, Tucson, USA(2001).
[14]W. J. Smith, Modern Optical Engineering, Mcgraw-Hill inc, Boston, USA(1966).
[15]K. L. Boehlen-Stassen, Phil T. Rumsby, A. Cerezo, M. Huang, “Fabrication of axisymmetric ceramic micro parts using pulsed laser ablation,” provided by Excitech Co, UK.
[16]H. Fukuda, A. Imai, T. Terasawa, S. Okazaki, “New Approach to Resolution Limit and Advanced Image Formation Techniques in Optical Lithography,” IEEE Transactions on electron devices, Vol. 38, p.67(1991).
[17]王金樹, 王述宜, 陳偉今, 陳建人, “準分子雷射與感應耦合離子蝕刻在V型溝槽上之製程研究,” 第十八屆全國機械工程學術研討會論文集, 第五冊, p.1(2001).
[18]Goodfellow CATALOGUE, Goodfellow Inc, PA, USA(1998).