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研究生： 石建中
Shih, Jain-Jung
論文名稱： 2-巰基乙醇在Cu(111)及Cu(100)表面上的熱反應研究
Study of Thermal Reactions of 2-Mercaptoethanol on Cu(111) and Cu(100) Surface
指導教授： 林榮良
Lin, Jong-Liang
學位類別： 碩士
Master
系所名稱： 理學院 - 化學系
Department of Chemistry
論文出版年： 2004
畢業學年度： 92
語文別： 中文
論文頁數： 85
中文關鍵詞： 反射式紅外光譜 、X光光電子能譜 、程溫反應/脫附 、銅(100) 、2-巰基乙醇 、銅(111) 、醇類 、硫醇
外文關鍵詞： XPS, RAIRS, TPR/D, Cu(100), Cu(111), alcohol, thiol, 2-Mercaptoethanol
相關次數： 點閱：72  下載：1 
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    • 　　本篇論文研究在超高真空系統中2-巰基乙醇(HSCH2CH2OH)吸附於銅單晶表面上的熱反應與其反應中間物。分別藉由程序控溫反應/脫附(Temperature-programmed reaction/desorption, TPR/D)、X-光光電子能譜(X-ray photoelectron spectroscopy, XPS)和反射式吸收紅外光譜(Reflection-absorption infrared spectroscopy，RAIRS)研究Cu(111)和Cu(100)的表面吸附和反應。在Cu(111)表面研究中發現，HSCH2CH2OH在溫度低於123K時會分解吸附於表面上形成-SCH2CH2OH，在較低的曝露量(0.6L)，-SCH2CH2OH在~223-323K之間完全轉變形成環狀中間物-SCH2CH2O-。當溫度繼續升至350K後，-SCH2CH2O-則再分解形成CH4、H2O、C2H4和CH3CHO。這兩種中間物在表面上的吸附情形會隨著曝露量的不同以及升溫過程而產生變化。較高的曝露量(≧6L)，-SCH2CH2OH僅有一部份會轉換成-SCH2CH2O-，在~225-300K還可發現有來自於一部份-SCH2CH2OH分解形成的C2H5OH產物脫附。在Cu(100)表面上，HSCH2CH2OH的熱分解過程除了與Cu(111)同樣會在表面上產生-SCH2CH2OH和-SCH2CH2O-之外，在455K的高溫環境下還可能存在著含C=C=O或C=C=S的表面物種。最後的反應產物CH4、C2H4和CH3CHO則在300-400K之間脫附。無論在Cu(111)或是Cu(100)表面上我們都沒有發現任何含有硫的產物脫附。

    　　The thermal reactions and surface intermediates of HSCH2CH2OH on Cu(100) and Cu(111) under ultra-high vacuum have been studied by temperature-programmed reaction/desorption (TPR/D), X-ray photoelectron spectroscopy (XPS), and reflection-absorption infrared spectroscopy. In the case of Cu(111), -SCH2CH2OH is generated from HSCH2CH2OH dissociative adsorption on Cu(111) below 123K. At lower coverages, -SCH2CH2OH transforms to -SCH2CH2O-, a cyclic intermediate between 223-323K. Above 350K, -SCH2CH2O- decomposes to form carbon-containing products of CH4, C2H4, and CH3CHO. The relative amount of these two intermediates is dependent on temperature and surface coverage. In the case of Cu(100), thermal decomposition of HSCH2CH2OH is similar to Cu(111) and produces intermediates of -SCH2CH2OH, -SCH2CH2O-, and surface species containing C=C=O or C=C=S. Carbon-containing products of CH4, C2H4, and CH3CHO evolve between 300-400K. Desorption of sulfur-containing products are not observed in both cases.

    目錄 第一章、緒論......................................1 第二章、表面研究之分析技術 2.1 歐傑電子能譜..................................6 2.2 程式控溫反應/脫附............................11 2.3 X光光電子能譜................................13 2.4 反射式紅外光譜儀.............................19 第三章、實驗系統與方法 3.1 超高真空系統.................................22 3.2 單晶表面的清潔及氧化表面的製備...............25 3.3 藥品及其前處理...............................27 第四章、結果與討論 4.1 HSCH2CH2OH在Cu(111)表面上的表面化學..........28 4.1.1 程序控溫反應/脫附實驗......................28 4.1.2 X光光電子能譜實驗..........................37 4.2 HSCH2CH2OH在Cu(100)表面上的表面化學..........66 4.2.1 程序控溫反應/脫附實驗......................66 4.2.2 反射式吸收紅外光光譜實驗...................72 第五章、結論.....................................80 參考文獻.........................................82

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