| 研究生: |
林奇正 Lin, Chi-Cheng |
|---|---|
| 論文名稱: |
單壁奈米碳管的成長與其應用於太陽能電池之研究 Synthesis of Single-walled Carbon Nanotubes Network and Its Applications as Solar Cell |
| 指導教授: |
高騏
Gau, Chie |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 航空太空工程學系 Department of Aeronautics & Astronautics |
| 論文出版年: | 2008 |
| 畢業學年度: | 96 |
| 語文別: | 中文 |
| 論文頁數: | 98 |
| 中文關鍵詞: | 太陽能電池 、p-n半導體 、退火處理 、非晶矽 、單壁奈米碳管 |
| 外文關鍵詞: | solar cell, n-type semiconductor, annealing, amorphous silicon, SWNT |
| 相關次數: | 點閱:77 下載:2 |
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無論就外貌、結構、電性或機械性質,奈米碳管均具有許多優異的特性,因此吸引許多研究奈米相關學者的興趣。在本研究中所使用的成長方法是酒精催化化學氣相沈積系統,此方法利用安全的酒精氣體作為碳源,可得到高純度與較大面積的單壁奈米碳管,而研究顯示此碳管具有n型半導體特性,具有較高的電子移動率,然後在碳管薄膜上沉積非晶矽,而p型是利用鋁摻雜於非晶矽中,因此形成p-i-n異質接面之太陽能電池結構。
在特性分析方面,首先將非晶矽材料利用鋁金屬藉由摻雜於不同退火時間處理下,可以發現其非晶矽表面結構與材料特性有明顯變化,而表面粗糙度也有大幅改善。
在元件的製程與量測方面,利用簡易的半導體製程將之製作太陽能電池,並使用入射光功率100mW/cm2之太陽模擬光源照射下進行量測,而得到I-V特性曲線。
透過實驗數據分析結果顯示,發現非晶矽經過鋁退火時間5小時、7小時、9小時所得到元件之光電轉換效率、短路電流密度、開路電壓要比退火時間1小時與3小時來的高,由此可知,非晶矽利用鋁摻雜,其退火時間有相當影響。
No matter the appearance, structure, electricity or mechanical properties, it is in charge of having a lot of excellent characteristics enduring the carbon nanotubes, so have attracted a great deal of interest from the research community and many scientific articles and books have been devoted to their synthesis, properties and applications. This SWNT network is so dense that it can be treated like a thin film. Analytical instruments are used to demonstrate that this as-grown SWNTs film has very uniform, stable n-type semiconductor property and does not change with time during growth, and then apply to active layer of the solar cell.
In characteristic analysis respect, utilize aluminum by doping amorphous silicon material on different annealing time, can detecting its amorphous silicon surface structure and material characteristic have obvious changes, and the roughness of surface is improved. Devices were tested using an Oriel solar simulator under AM1.5 D spectral illumination of 100 mW /cm2 (1 sun ) immediately after device fabrication.
Show through the analysis result of the experimental data, find amorphous silicon for 5 and 7 hours through the annealing time of aluminum, which power conversion efficiency, low short circuit current density, open circuit voltage higher than annealing time 1 and 3 hours, therefore, utilizes aluminum to dope amorphous silicon is influenced by annealing time.
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