本研究使用高功率脈衝磁控濺鍍系統(HiPIMS)進行氮化鉻鍍層的製備，實驗會透過田口實驗方法(L9直交表)進行氮化鉻鍍層(CrN)的參數設計，在本次實驗中會改變四種不同的濺鍍參數(底材偏壓、脈衝時間、氮氬流量比與脈衝時間)來進行九組試片的濺鍍作業，並透過不同的實驗方法，進行C1~C9鍍層的結構、機械性質(奈米硬度與附著性等等) 的分析與探討，實驗中會使用兩種不同的對磨球(AISI 52100與Si3N4)來探討鍍層的磨潤性質(包括摩擦係數、磨耗深度與磨耗率等結果)，最後再透過田口實驗方法的S/N比推論出擁有最佳磨潤性質的C10鍍層與微調鍍層參數後期望有最佳附著性的C11鍍層，並進行C10鍍層與C11鍍層的機械性質與磨潤性質的分析與整理探討。
在本實驗中，共會進行九組試片(C1~C9)的濺鍍作業，並進行兩組(C10、C11)不同鍍層參數的驗證實驗，綜合所有的結果後，會選擇一組最佳的鍍層參數進行微鑽針的濺鍍作業，並探討此鍍層可以改善未被覆鍍層之微鑽針多少的壽命。故由結果可以知道，C10鍍層具有很高的硬度(41.2 GPa)與最好的Lc1與Lc2 (81.6 N與100 N)，且在與AISI 52100對磨球對磨時有很低的磨耗深度與磨耗率，代表C10鍍層可以提升底材的抗磨耗表現，所以決定將C10鍍層被覆於微鑽針上，並進行高速鑽削實驗的鑽削測試，最後發現被覆C10鍍層之微鑽針在鑽削至4000孔後，仍然保持著業界的標準，表示被覆C10鍍層的微鑽針可以至少改善未被覆鍍層之微鑽針的2倍壽命以上。

In this study, the CrN coatings were deposited on WC substrate by HiPIMS technology. There are four different parameters of substrate bias (-40 V, -60 V and -80 V), pulse current (150 A, 250 A and 350 A), N2/Ar (50/30, 40/40 and 30/50) and pulse duration (150 μs, 200 μs and 250 μs) to investigate the tribological properties. The optimal factor levels in terms of wear rate was determined by Taguchi method (L9). To sum up, according to the results of the analysis, of all the coatings, C10 coating is the best coating in this study, which has not only high hardness (41.2 GPa) and adhesion Lc (100 N) but also excellent wear resistance. In addition, C10 was chosen to deposit on micro-drills to improve the lifetime of micro-drills. In the end, it can note that C10 coated micro-drills can improve twice times lifetime comparing with uncoated micro-drills.

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