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研究生: 周子翔
Chou, Zih-Siang
論文名稱: 以堆疊式鋯鈦酸鋇/二元氧化物結構為閘極介電層之五環素薄膜電晶體
Pentacene-based Thin Film Transistors With Stacked Barium Zirconate Titanate/Binary Oxide As The Gate Dielectrics
指導教授: 洪茂峰
Houng, Mau-Phon
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2018
畢業學年度: 106
語文別: 中文
論文頁數: 80
中文關鍵詞: 有機薄膜電晶體低操作電壓五環素
外文關鍵詞: OTFT, low operation voltage, pentacene
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  • 在本論文中,我們準備了高品質的高介電係數溶液式BZT閘極介電層薄膜作為五環素有機薄膜電晶體,元件的特性表現出了好的臨界電壓(-1.1V), 次臨界擺幅(0.51 V/dec), 電流開關比(2.3x102), 載子遷移率(4.98cm2/V-1S-1)。更進一步討論,為了得到更好的元件特性,我們利用高介電係數HfO2與 BZT之雙層閘極介電層結構,這些元件展現了好的元件特性,例如低臨界電壓(-0.25V), 低次臨界擺幅(0.46 V/dec), 高電流開關比(103), 高載子遷移率(3.65cm2/V-1S-1 )以及低操作電壓,我們更詳細地對化學與物理特性進行分析,其中包括SEM, XRD, AFM分析。
    綜上所述,我們已經成功地展示高品質溶液式BZT及HfO2雙層結構之閘極介電層並運用於有機薄膜電晶體,這項工作提供了很多優勢,如低臨界電壓、低次臨界擺幅、高電流開關比、高載子遷移率以及低操作電壓,這也說明了元件有著優秀的操作特性。

    In this thesis, we prepared the high quality solution-processed high-κ Barium Zirconate Titanate (BZT) as gate dielectric for pentacene-based organic thin film transistor (OTFT) devices were demonstrated. The performance of the devices shows good threshold voltage(-1.1V), subthreshold swing(0.51 V/dec), current on/off ratio(2.3x102), mobility of 4.98cm2V-1S-1. Further, in order to get better performance of the devices, we utilized the double structure with high-κ HfO2 and BZT. These devices exhibited good performances, such as low threshold voltage(-0.25V), low subthreshold swing(0.46 V/dec), high current on/off ratio(103), high mobility of 3.65cm2V-1S-1 and operate at low gate voltage. We analyzed in detail with chemical and physical characteristics including SEM, XRD, XPS, AFM.
    In summary, we have been successfully demonstrated high quality double structure with solution-processed oxide(BZT) and HfO2 applied as gate dielectric on OTFT. This work provides a lot of advantages, such as low threshold voltage, low subthreshold swing, high current on/off ratio, high mobility and operate at low gate voltage which indicates good performance of devices.

    摘要 i 致謝 vii 目錄 viii 表目錄 x 圖目錄 xi 第一章緒論 1 1-1前言 1 1-2有機薄膜電晶體發展 2 1-3研究動機 4 第二章文獻與理論基礎 6 2-1有機薄膜電晶體基本結構 6 2-2有機薄膜電晶體材料 7 2-2-1鈣鈦礦材料 7 2-2-2五環素 8 2-2-3二元氧化物 8 2-3有機半導體材料傳導機制 9 2-4有機薄膜電晶體操作機制 12 2-4-1操作電流(ID Current) 14 2-4-2轉移電導(Transconductance) 14 2-4-3載子遷移率(Mobility) 15 2-4-4臨界電壓(Threshold voltage) 15 2-4-5次臨界擺幅(Subthreshold Swing) 16 2-4-6開關電流比(Ion/Ioff ratio) 16 第三章實驗方法與量測儀器介紹 18 3-1 元件製備 18 3-1-1 玻璃基板的清理 18 3-1-2 重摻雜矽基板的清理 18 3-1-3 Gate Layer遮罩 20 3-1-4 BZT溶液配置 20 3-1-5 閘極氧化層製作 25 3-1-6 Active Layer遮罩 27 3-1-7 有機半導體主動層 27 3-1-8 Source/Drain遮罩 28 3-1-9 Source/Drain接觸電極 29 3-2 實驗製程設備系統 30 3-2-1 RF射頻磁控濺鍍機(RF sputtering) 30 3-2-2 共濺鍍機(Co-sputtering) 31 3-2-3 有機蒸鍍機(Thermal evaporation) 32 3-2-4 旋轉塗步機(Spin Coater) 33 3-3實驗量測設備 34 3-3-1半導體元件分析儀(Semiconductor parameter analyzer) 34 3-3-2原子力顯微鏡(Atomic Force Microscope, AFM) 35 3-3-3場發射掃描式電子顯微鏡(Field Emission-Scanning Electron Microscope, FE-SEM) 36 3-3-4 X光繞射儀(X-Ray Diffraction, XRD) 37 3-3-5 X光電子能譜分析(X-ray photoelectron Spectroscopy, XPS) 37 3-3-6 接觸角量測儀 (Contact angle) 38 第四章結果與討論 40 4-1元件介電層分析 40 4-1-1介電層XRD分析 40 4-1-2介電層表面特性分析 42 4-1-3 介電層SEM分析 48 4-1-4 介電層Surface Energy分析 51 4-2電晶體電性量測(I-V) 55 4-2-1用BZT溶液製備介電層之有機薄膜電晶體 55 4-2-2用SiO2閘極介電層之有機薄膜電晶體 57 4-2-3用HfO2閘極介電層之有機薄膜電晶體 59 4-2-4用SiO2+BZT閘極介電層之有機薄膜電晶體 61 4-2-5用HfO2+BZT閘極介電層之有機薄膜電晶體 63 4-2-6 各閘極介電層之有機薄膜電晶體特性 65 4-3 五環素薄膜分析 66 4-3-1五環素表面特性分析 66 4-3-2五環素XRD分析 72 第五章 結論 76 第六章未來工作 77 參考文獻 78

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